High Quality Inductively Coupled Plasma Chemical Vapor Deposited SiOxNy Gas Barrier Films for OLED Display

ECS Meeting Abstracts ◽

10.1149/ma2014-02/29/1594 ◽

2014 ◽

Keyword(s):

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

High Quality ◽

Gas Barrier ◽

Barrier Films ◽

Inductively Coupled ◽

Chemical Vapor Deposited ◽

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Organosilicon function of gas barrier films purely deposited by inductively coupled plasma chemical vapor deposition system

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2012.07.053 ◽

2012 ◽

Vol 542 ◽

pp. 11-16 ◽

Author(s):

Tung-Ying Lin ◽

Ching-Ting Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Gas Barrier ◽

Plasma Chemical Vapor Deposition ◽

Barrier Films ◽

Inductively Coupled

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a-IGZO TFTs With Inductively Coupled Plasma Chemical Vapor Deposited ${\rm SiO}_{x}$ Gate Dielectric

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2266414 ◽

2013 ◽

Vol 60 (8) ◽

pp. 2687-2690 ◽

Author(s):

Xiang Xiao ◽

Wei Deng ◽

Xin He ◽

Shengdong Zhang

Keyword(s):

Inductively Coupled Plasma ◽

Gate Dielectric ◽

Chemical Vapor ◽

Plasma Chemical ◽

Inductively Coupled ◽

Chemical Vapor Deposited

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Oxygen Gas Barrier Properties of Hydrogenated Amorphous Carbon Thin Films Deposited with a Pulse-Biased Inductively Coupled Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.08jf10 ◽

2010 ◽

Vol 49 (8) ◽

pp. 08JF10 ◽

Author(s):

Sang-min Baek ◽

Tatsuru Shirafuji ◽

Sung-pyo Cho ◽

Nagahiro Saito ◽

Osamu Takai

Keyword(s):

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Barrier Properties ◽

Chemical Vapor Deposition Method ◽

Plasma Chemical ◽

Gas Barrier ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Hydrogenated Amorphous

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Controllable Synthesis of High-Quality Graphene Using Inductively-Coupled Plasma Chemical Vapor Deposition

ECS Meeting Abstracts ◽

10.1149/ma2012-02/50/3513 ◽

2012 ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Controllable Synthesis ◽

Plasma Chemical ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High quality nanocrystalline silicon thin film fabricated by inductively coupled plasma chemical vapor deposition at 350°C

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2007.09.082 ◽

2008 ◽

Vol 354 (19-25) ◽

pp. 2268-2271 ◽

Author(s):

Sang-Myeon Han ◽

Sun-Jae Kim ◽

Joong-Hyun Park ◽

Sung-Hwan Choi ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Plasma Chemical ◽

Silicon Thin Film ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Controllable Synthesis of High-Quality Graphene Using Inductively-Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/2.082204jes ◽

2012 ◽

Vol 159 (4) ◽

pp. K93-K96 ◽

Author(s):

Lam Van Nang ◽

Eui-Tae Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Controllable Synthesis ◽

Plasma Chemical ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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