scholarly journals Mechanical Characterization of Torsional Micropaddles Using Atomic Force Microscopy

2018 ◽  
Vol 2018 ◽  
pp. 1-7 ◽  
Author(s):  
N. Mahmoodi ◽  
A. Sabouri ◽  
J. Bowen ◽  
C. J. Anthony ◽  
P. M. Mendes
Keyword(s):  
Atomic Force Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Spring Constant ◽  
Simple Method ◽  
Force Microscopy ◽  
Atomic Force ◽  
Torsional Spring

The reference cantilever method is shown to act as a direct and simple method for determination of torsional spring constant. It has been applied to the characterization of micropaddle structures similar to those proposed for resonant functionalized chemical sensors and resonant thermal detectors. It is shown that this method can be used as an effective procedure to characterize a key parameter of these devices and would be applicable to characterization of other similar MEMS/NEMS devices such as micromirrors. In this study, two sets of micropaddles are manufactured (beams at centre and offset by 2.5 μm) by using LPCVD silicon nitride as a substrate. The patterning is made by direct milling using focused ion beam. The torsional spring constant is achieved through micromechanical analysis via atomic force microscopy. To obtain the gradient of force curve, the area of the micropaddle is scanned and the behaviour of each pixel is investigated through an automated developed code. The experimental results are in a good agreement with theoretical results.

Fabrication of Ga-templates Using a Focused Ion Beam

2009 ◽  
Vol 1228 ◽  
Author(s):  
Hao Wang ◽  
Greg C. Hartman ◽  
Joshua Williams ◽  
Jennifer L. Gray
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Processing Conditions ◽  
New Materials ◽  
Force Microscopy ◽  
Atomic Force ◽  
Nitridation Process ◽  
Microscopy Characterization ◽  
Device Technology

AbstractThere are many factors that have the potential to limit significant advances in device technology. These include the ability to arrange materials at shrinking dimensions and the ability to successfully integrate new materials with better properties or new functionalities. To overcome these limitations, the development of advanced processing methods that can organize various combinations of materials at nano-scale dimensions with the necessary quality and reliability is required. We have explored using a gallium focused ion beam (FIB) as a method of integrating highly mismatched materials with silicon by creating template patterns directly on Si with nanoscale resolution. These templates are potentially useful as a means of locally controlling topography at nanoscale dimensions or as a means of locally implanting Ga at specific surface sites. We have annealed these templates in vacuum to study the effects of ion dosage on local Ga concentration and topography. We have also investigated the feasibility of creating Ga nanodots using this method that could eventually be converted to GaN through a nitridation process. Atomic force microscopy and electron microscopy characterization of the resulting structures are shown for a variety of patterning and processing conditions.

High Contrast Imaging of Interphases in Ternary Polymer Blends Using Focused Ion Beam Preparation and Atomic Force Microscopy

2005 ◽  
Vol 38 (6) ◽  
pp. 2368-2375 ◽  
Author(s):  
Nick Virgilio ◽  
Basil D. Favis ◽  
Marie-France Pépin ◽  
Patrick Desjardins ◽  
Gilles L'Espérance
Keyword(s):  
Atomic Force Microscopy ◽  
Polymer Blends ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Contrast ◽  
Contrast Imaging ◽  
Force Microscopy ◽  
Atomic Force ◽  
High Contrast Imaging ◽  
Ternary Polymer

scholarly journals Fabrication of probe tips via the FIB method for nanodiagnostics of the surface of solids by atomic force microscopy

2021 ◽  
Vol 2086 (1) ◽  
pp. 012204
Author(s):  
D J Rodriguez ◽  
A V Kotosonova ◽  
H A Ballouk ◽  
N A Shandyba ◽  
O I Osotova ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Atomic Force Microscope ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Contact Mode ◽  
Ion Etching ◽  
Force Microscopy ◽  
Atomic Force

Abstract In this work, we carried out an investigation of commercial atomic force microscope (AFM) probes for contact and semi-contact modes, which were modified by focused ion beam (FIB). This method was used to modify the original tip shape of silicon AFM probes, by ion-etching and ion-enhance gas deposition. we show a better performance of the FIB-modified probes in contrast with the non-modified commercial probes. These results were obtained after using both probes in semi-contact mode in a calibration grating sample.

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