scholarly journals Focused Ion Beam-Atomic Force Microscopy Technique for Sidewall Roughness Measurement of Free-Standing Objects with Sub-μm Size

2019 ◽  
Vol 26 (2) ◽  
pp. 194-195
Author(s):  
T. Nakao ◽  
Y. Fujimoto ◽  
T. Nagatomi
Keyword(s):  
Atomic Force Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Roughness Measurement ◽  
Sidewall Roughness ◽  
Free Standing ◽  
Force Microscopy ◽  
Atomic Force Microscopy Technique ◽  
Microscopy Technique ◽  
Atomic Force

Application of focused ion-beam sampling for sidewall-roughness measurement of free-standing sub-μm objects by atomic force microscopy

Microscopy ◽  
2020 ◽  
Vol 69 (1) ◽  
pp. 11-16
Author(s):  
Takaharu Nagatomi ◽  
Tatsuya Nakao ◽  
Yoko Fujimoto
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Focused Ion Beam ◽  
Microelectromechanical Systems ◽  
Ion Beam ◽  
Sampling Technique ◽  
Roughness Parameters ◽  
Free Standing ◽  
Force Microscopy ◽  
Atomic Force

Abstract In the present study, a free-standing object-sampling technique for microelectromechanical systems (MEMS) is developed to measure their sidewall surface roughnesses by atomic force microscopy (AFM). For this purpose, a conventional focused ion beam (FIB) sampling technique widely used for cross-sectional transmission electron microscope specimen preparation was applied. The sub-nm-order roughness parameters were quantitatively measured for sidewalls of Si-bridge test samples. The roughness parameters were compared before and after H2 annealing treatment, which induced smoothing of the surface by migration of the Si atoms. The reduction in the surface roughness by a factor of approximately one-third with 60-s H2 annealing was quantitatively evaluated by AFM. The present study confirms that the developed FIB–AFM technique is one potential approach for quantitatively evaluating the surface-roughness parameters on the oblique faces of free-standing objects in MEMS devices.

High aspect ratio all diamond tips formed by focused ion beam for conducting atomic force microscopy

1999 ◽  
Vol 17 (4) ◽  
pp. 1570 ◽  
Author(s):  
A. Olbrich ◽  
B. Ebersberger ◽  
C. Boit ◽  
Ph. Niedermann ◽  
W. Hänni ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Force Microscopy ◽  
Atomic Force

High Contrast Imaging of Interphases in Ternary Polymer Blends Using Focused Ion Beam Preparation and Atomic Force Microscopy

2005 ◽  
Vol 38 (6) ◽  
pp. 2368-2375 ◽  
Author(s):  
Nick Virgilio ◽  
Basil D. Favis ◽  
Marie-France Pépin ◽  
Patrick Desjardins ◽  
Gilles L'Espérance
Keyword(s):  
Atomic Force Microscopy ◽  
Polymer Blends ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Contrast ◽  
Contrast Imaging ◽  
Force Microscopy ◽  
Atomic Force ◽  
High Contrast Imaging ◽  
Ternary Polymer

XANES AND ATOMIC FORCE MICROSCOPY STUDIES ON PRE- AND POST-IRRADIATED SAPPHIRE

2008 ◽  
Vol 22 (30) ◽  
pp. 3007-3013 ◽  
Author(s):  
D. M. BHARDWAJ ◽  
D. C. JAIN ◽  
RAVI KUMAR ◽  
R. P. GUPTA ◽  
K. B. GARG
Keyword(s):  
Atomic Force Microscopy ◽  
Single Crystal ◽  
South African ◽  
Structural Changes ◽  
Force Microscopy ◽  
Atomic Force Microscopy Technique ◽  
Microscopy Technique ◽  
Atomic Force ◽  
Sapphire Single Crystal ◽  
Edge Features

XANES measurements at the Fe - K edge on natural South African sapphire single crystal (corundum) and an irradiated sample with fluence 1 × 1012 Ni 6+ ions/cm 2 are reported. Some decrease in intensity of pre-edge features (1s → 3d) and increase in intensity of 1s → 4p transition in Fe is observed with Ni fluence. Structural changes and modification on surface of irradiated sapphire with Ni 6+ ion have been observed by the atomic force microscopy technique and discussed in the term of defects.

scholarly journals Fabrication of probe tips via the FIB method for nanodiagnostics of the surface of solids by atomic force microscopy

2021 ◽  
Vol 2086 (1) ◽  
pp. 012204
Author(s):  
D J Rodriguez ◽  
A V Kotosonova ◽  
H A Ballouk ◽  
N A Shandyba ◽  
O I Osotova ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Atomic Force Microscope ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Contact Mode ◽  
Ion Etching ◽  
Force Microscopy ◽  
Atomic Force

Abstract In this work, we carried out an investigation of commercial atomic force microscope (AFM) probes for contact and semi-contact modes, which were modified by focused ion beam (FIB). This method was used to modify the original tip shape of silicon AFM probes, by ion-etching and ion-enhance gas deposition. we show a better performance of the FIB-modified probes in contrast with the non-modified commercial probes. These results were obtained after using both probes in semi-contact mode in a calibration grating sample.

Sidewall roughness measurement inside photonic crystal holes by atomic force microscopy

2007 ◽  
Vol 18 (40) ◽  
pp. 405703 ◽  
Author(s):  
P Strasser ◽  
F Robin ◽  
C F Carlström ◽  
R Wüest ◽  
R Kappeler ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Photonic Crystal ◽  
Roughness Measurement ◽  
Sidewall Roughness ◽  
Force Microscopy ◽  
Atomic Force
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