Optical and Electrical Properties of Nanocrystalline Films Formed from Amorphous Silicon by Thermal Annealing and Stain Etching

2012 ◽  
Vol 7 (6) ◽  
pp. 629-632 ◽  
Author(s):  
A. V. Pavlikov ◽  
I. A. Gayduchenko ◽  
G. K. Mussabek ◽  
E. T. Taurbaev ◽  
T. I. Taurbaev ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Optical And Electrical Properties ◽  
Nanocrystalline Films ◽  
Stain Etching

Structural, Optical, and Electrical Properties of Amorphous Silicon Films

1970 ◽  
Vol 1 (6) ◽  
pp. 2632-2641 ◽  
Author(s):  
M. H. Brodsky ◽  
R. S. Title ◽  
K. Weiser ◽  
G. D. Pettit
Keyword(s):  
Electrical Properties ◽  
Amorphous Silicon ◽  
Silicon Films ◽  
Optical And Electrical Properties

Optical and electrical properties of evaporated amorphous silicon with hydrogen

1979 ◽  
Vol 50 (5) ◽  
pp. 3407-3413 ◽  
Author(s):  
A. K. Ghosh ◽  
T. McMahon ◽  
E. Rock ◽  
H. Wiesmann
Keyword(s):  
Electrical Properties ◽  
Amorphous Silicon ◽  
Optical And Electrical Properties

Influence of film thickness on optical and electrical properties of hydrogenated amorphous silicon

1987 ◽  
Vol 150 (1) ◽  
pp. 1-9 ◽  
Author(s):  
F. Demichelis ◽  
G. Kaniadakis ◽  
E. Mezzetti ◽  
P. Mpawenayo ◽  
A. Tagliaferro ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Film Thickness ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Optical And Electrical Properties ◽  
Hydrogenated Amorphous

Optical and Electrical Properties of Hydrogenated Amorphous Silicon Nitride Films Deposited in Various PECVD systems

1986 ◽  
Vol 68 ◽  
Author(s):  
Nancy Voke ◽  
Jerzy Kanicki
Keyword(s):  
Silicon Nitride ◽  
Electrical Properties ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Optical And Electrical Properties ◽  
Amorphous Silicon Nitride ◽  
Full Characterization ◽  
Silicon Nitride Films ◽  
Hydrogenated Amorphous

Hydrogenated amorphous silicon nitride films, prepared in various commercially available plasma enhanced chemical vapor deposition systems, have been investigated in terms of different deposition conditions.The full characterization of these gate insulators has been carried out by different techniques.Experimental data and interesting findings obtained from this study are presented.Special attention has been devoted to the influence of hydrogen on optical and electrical properties.

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