In this work, the study of the structural characterization of copper oxide by the X-ray diffraction technique is presented. To obtain layers of copper oxide, sputtering and thermal oxidation techniques were combined. The average crystal size was calculated for the sputtered copper samples. For the copper oxide films obtained by thermal oxidation, both the crystal size and the texture coefficient were calculated. The crystalline quality was poor for layers obtained by sputtering. Thermal oxidation carried out on these films transformed its structure to the copper oxide phase known as cupric oxide.
Structural characterisation of copper oxide by X-ray diffraction