Considerable development work has taken place in the novel technique of plasma source ion implantation (PSII) for the purpose improving the tribological properties of metal surfaces. Original studies involved using nitrogen plasmas to implant nitrogen ions into irregular shaped surfaces. More recently heavy ions have also been implanted. The advantages of the process over conventional ion implantation techniques are numerous, however one distinct disadvantage was the fact that the target had to be conductive, since it acted as the cathode of the system. We report here on a technique to overcome this problem, especially when implanting heavy ions into an insulator material of small dimensions (1-3 mm across) using the PSII system. Also reported are IBA techniques employed to characterize the implantation profile.