Phase stability of CdO on zincblende layers grown on GaAs substrates by metalorganic molecular-beam epitaxy

2002 ◽  
pp. 339-356
1994 ◽  
Vol 136 (1-4) ◽  
pp. 204-209 ◽  
Author(s):  
D. Marx ◽  
H. Asahi ◽  
X.F. Liu ◽  
Y. Okuno ◽  
K. Inoue ◽  
...  

1990 ◽  
Vol 29 (Part 2, No. 5) ◽  
pp. L727-L730 ◽  
Author(s):  
Yi-hong Wu ◽  
Takashi Toyoda ◽  
Yoichi Kawakami ◽  
Shizuo Fujita ◽  
Shigeo Fujita

1998 ◽  
Vol 535 ◽  
Author(s):  
M. Yoshimoto ◽  
J. Saraie ◽  
T. Yasui ◽  
S. HA ◽  
H. Matsunami

AbstractGaAs1–xPx (0.2 <; x < 0.7) was grown by metalorganic molecular beam epitaxy with a GaP buffer layer on Si for visible light-emitting devices. Insertion of the GaP buffer layer resulted in bright photoluminescence of the GaAsP epilayer. Pre-treatment of the Si substrate to avoid SiC formation was also critical to obtain good crystallinity of GaAsP. Dislocation formation, microstructure and photoluminescence in GaAsP grown layer are described. A GaAsP pn junction fabricated on GaP emitted visible light (˜1.86 eV). An initial GaAsP pn diode fabricated on Si emitted infrared light.


1989 ◽  
Vol 55 (17) ◽  
pp. 1750-1752 ◽  
Author(s):  
C. R. Abernathy ◽  
S. J. Pearton ◽  
R. Caruso ◽  
F. Ren ◽  
J. Kovalchik

Sign in / Sign up

Export Citation Format

Share Document