Improving optical properties of silicon nitride films to be applied in the middle infrared optics by a combined high-power impulse/unbalanced magnetron sputtering deposition technique

2014 ◽  
Vol 53 (4) ◽  
pp. A377 ◽  
Author(s):  
Bo-Huei Liao ◽  
Chien-Nan Hsiao
Keyword(s):  
Optical Properties ◽  
Silicon Nitride ◽  
Magnetron Sputtering ◽  
Deposition Technique ◽  
Sputtering Deposition ◽  
Infrared Optics ◽  
Silicon Nitride Films ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Middle Infrared

Microstructure and Properties of AlSn20 Coating Deposited via Magnetron Sputtering

2015 ◽  
Vol 816 ◽  
pp. 277-282
Author(s):  
Qiao Qin Guo ◽  
Jian Ping Li
Keyword(s):  
Magnetron Sputtering ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Wear And Friction ◽  
Pin On Disc ◽  
Alloy Microstructure ◽  
Bearing Alloy ◽  
Deposition Techniques

In view of the present reality of sputtered plating bearings imported in our country, unbalanced magnetron sputtering deposition techniques was used to fabricate AlSn20 anti-friction coating on aluminum bearing alloy. Microstructure characterization of the coating was performed by SEM. Micro-hardness testing of Coating were measured with a Vickers indenter. Adhesion testing was carried out with a scratch tester. Wear and friction tests were performed with a pin-on-disc tribometer. The results revealed that the AlSn20 anti-friction coating (bias voltage in the range of-60V~-100V) showed finer crystal, better corrosion resistance (Ecorr=-1.25V), higher hardness (up to 80HV0.025), better adhesion with substrate (up to 35N), and lower friction coefficients down to 0.15.

scholarly journals Effect on Silicon Nitride thin Films Properties at Various Powers of RF Magnetron Sputtering

2018 ◽  
Vol 7 (4.30) ◽  
pp. 39 ◽  
Author(s):  
M K Mustafa ◽  
U Majeed ◽  
Y Iqbal
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Surface Roughness ◽  
Optical Properties ◽  
Silicon Nitride ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Silicon Nitride Films ◽  
Ftir Characterization ◽  
Sputtering Power

Silicon nitride thin films have numerous applications in microelectronics and optoelectronics fields due to their unique properties. In this work, silicon nitride thin films were produced using radio frequency (R.F.) magnetron sputtering technique at various sputtering powers. The prepared thin films were characterized with XRD, FE-SEM, FTIR, surface profiler, AFM and spectral reflectance techniques for structure, surface morphology, chemical bonding information, growth rate, surface roughness and optical properties. The results showed that silicon nitride thin films were amorphous in nature. The films were smooth and densely packed with no voids or cracks at the surface. FTIR characterization informed about Si-N bonding existence which confirmed the formation of silicon nitride films. The sputtering power showed the impetus effect on growth rate, surface roughness and optical properties of produced films.

Sign in / Sign up

Export Citation Format

Share Document