Arrays of Microplasma-assisted Atomic Layer Deposition and Etching Free Patterning of Ga2O3 Thin Film with Flexible DUV Photodetector

2021 ◽  
Author(s):  
Jinhong Kim ◽  
Andrey E. Mironov ◽  
Dane J. Sievers ◽  
Sung-jin Park ◽  
J. Gary Eden
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Ga2o3 Thin Film

Ga2O3 THIN FILM DEPOSITED BY ATOMIC LAYER DEPOSITION WITH HIGH PLASMA POWER

2006 ◽  
Vol 80 (1) ◽  
pp. 197-206 ◽  
Author(s):  
F. K. SHAN ◽  
G. X. LIU ◽  
W. J. LEE ◽  
G. H. LEE ◽  
I. S. KIM ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Plasma ◽  
Plasma Power ◽  
Layer Deposition ◽  
Ga2o3 Thin Film ◽  
High Plasma Power

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

2013 ◽  
Vol 542 ◽  
pp. 219-224 ◽  
Author(s):  
Väino Sammelselg ◽  
Ivan Netšipailo ◽  
Aleks Aidla ◽  
Aivar Tarre ◽  
Lauri Aarik ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Chemical Resistance ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition

2014 ◽  
Vol 64 (9) ◽  
pp. 15-21 ◽  
Author(s):  
G. Y. Cho ◽  
S. Noh ◽  
Y. H. Lee ◽  
S. Ji ◽  
S. W. Cha
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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