Enhanced conversion efficiency of a crystalline silicon solar cell with frustum nanorod arrays

2011 ◽  
Author(s):  
Min-An Tsai ◽  
Ping-Chen Tseng ◽  
Hsin-Chu Chen ◽  
Hao-Chung Kuo ◽  
Peichen Yu
Keyword(s):  
Solar Cell ◽  
Conversion Efficiency ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Nanorod Arrays

scholarly journals Enhanced conversion efficiency of a crystalline silicon solar cell with frustum nanorod arrays

2010 ◽  
Vol 19 (S1) ◽  
pp. A28 ◽  
Author(s):  
Min-An Tsai ◽  
Ping-Chen Tseng ◽  
Hsin-Chu Chen ◽  
Hao-Chung Kuo ◽  
Peichen Yu
Keyword(s):  
Solar Cell ◽  
Conversion Efficiency ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Nanorod Arrays

Large-scale black multi-crystalline silicon solar cell with conversion efficiency over 18 %

2014 ◽  
Vol 116 (2) ◽  
pp. 683-688 ◽  
Author(s):  
Zhihao Yue ◽  
Honglie Shen ◽  
Ye Jiang ◽  
Weilong Chen ◽  
Quntao Tang ◽  
...  
Keyword(s):  
Solar Cell ◽  
Conversion Efficiency ◽  
Large Scale ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell

scholarly journals Performance of conversion efficiency of a crystalline silicon solar cell with base doping density

2017 ◽  
Vol 7 ◽  
pp. 4264-4268 ◽  
Author(s):  
Gokhan Sahin ◽  
Genber Kerimli ◽  
Fabe Idrissa Barro ◽  
Moustapha Sane ◽  
Mehmet Hakkı Alma
Keyword(s):  
Solar Cell ◽  
Conversion Efficiency ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Doping Density ◽  
Base Doping

The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744101 ◽  
Author(s):  
Bitao Chen ◽  
Yingke Zhang ◽  
Qiuping Ouyang ◽  
Fei Chen ◽  
Xinghua Zhan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Double Layers ◽  
Crystalline Silicon Solar Cell

SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.

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