The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells
2017 ◽
Vol 31
(16-19)
◽
pp. 1744101
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Keyword(s):
Gas Flow
◽
SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.
1993 ◽
Vol 32
(Part 2, No. 6A)
◽
pp. L770-L773
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Keyword(s):
2007 ◽
Vol 46
(1)
◽
pp. 56-59
◽
2009 ◽
Vol 54
(1)
◽
pp. 194-199
◽
2007 ◽
Vol 46
(1)
◽
pp. 1-6
◽
2003 ◽
Vol 93
◽
pp. 109-114
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Keyword(s):