Transverse second- and third-order geometrical aberrations of optical systems with pseudoaxion-type aspheric surfaces

1999 ◽  
Vol 66 (7) ◽  
pp. 658
Author(s):  
R. E. Il'inski
2011 ◽  
Vol 31 (2) ◽  
pp. 0222004
Author(s):  
郝沛明 Hao Peiming ◽  
李可新 Li Kexin ◽  
袁立银 Yuan Liyin

2007 ◽  
Vol 364-366 ◽  
pp. 1142-1146 ◽  
Author(s):  
Michael F. Kuechel ◽  
Daniel M. Sykora

Recent developments in next generation disc technology, cameras in mobile phones, zoom-lenses for small digital cameras and camcorders, digital SLRs, and television cameras have amplified the demand for affordable optical systems with outstanding image quality, a combination that can only be achieved using aspheric surfaces. The metrology of aspheric surfaces is a classical problem, but solutions so far have not fulfilled all demands for system cost, TACT (Total Average Cycle Time), minimized tooling, measurement uncertainty, spatial resolution, robustness in a production environment and many more. Zygo Corp. presents here a new method [1,2] for measurement of rotationally symmetrical aspheric surfaces using a new commercial system, which has the potential to fulfill these industry requirements. During measurement, the surface is scanned along its symmetry axis in a Fizeau cavity with a spherical reference surface. The coordinates x,y,z at the (moving) zone of normal incidence are derived from simultaneous phase-measurements at the apex and zone. Phase-shifting Fizeau interferometry and displacement interferometry are combined in the new commercial system to realize this new method. Aspheric departure from a best-fitsphere approaching 800 microns can be measured, and absolute measurement is possible with an absolutely calibrated transmission sphere. A custom parabolic artifact is measured with conventional null Fizeau interferometry and by the new commercial system. Data is reported for each technique along with a difference map achieved by fiducialized data subtract where 32.0 nm peak-to-valley (PV) and 3.6 nm R.M.S. are achieved.


2019 ◽  
Vol 26 (5) ◽  
pp. 1558-1564
Author(s):  
Yiqing Cao ◽  
Zhijuan Shen ◽  
Zhixia Zheng

Based on the the third-order aberration theory of plane-symmetric optical systems, this paper studies the effect on aberrations of the second-order accuracy of aperture-ray coordinates and the extrinsic aberrations of this kind of optical system; their calculation expressions are derived. The resultant aberration expressions are then applied to calculate the aberrations of two design examples of soft X-ray and vacuum ultraviolet (XUV) optical systems; images are compared with ray-tracing results using SHADOW software to validate the aberration expressions. The study shows that the accuracy of the aberration expressions is satisfactory.


The theory of characteristic functions, developed by Sturrock for electron optics, is used to calculate the primary aberrations of rectilinear orthogonal systems of the most general kind. In the second part, the secondary aberrations of round systems are calculated with the aid of Sturrock’s second-order perturbation characteristic functions. A proof of the equivalence of the aberration formulae obtained by Melkich, using the variation of parameters method, and those obtained below is offered in an appendix.


2020 ◽  
Vol 27 (6) ◽  
pp. 1477-1484
Author(s):  
Yiqing Cao ◽  
Zhijuan Shen ◽  
Haihe Xie

A third-order aberration analytical analysis method of soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of elements is proposed. Firstly, the transfer equations of the aperture ray and the principle ray are derived; then, based on the third-order aberration theory with the aperture-ray coordinates on the reference exit wavefront of a plane-symmetric optical system, the aberration expressions contributed by the wave aberration and defocus of this kind of optical system are studied in detail. Finally, the derived aberration calculation expressions are applied to calculate the aberration of two design examples of such types of optical systems; the images are compared with ray-tracing results obtained using the Shadow software to validate the aberration expressions. The study shows that the accuracy of the aberration expressions is satisfactory. The analytical analysis method of aberration is helpful in the design and optimization of the soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of optical elements.


Author(s):  
Vladimir A. GORSHKOV ◽  
Alexey S. SAVELYEV ◽  
Artem S. NEVROV ◽  
Aleksandra V. SMIRNOVA

The paper reviews advanced process for manufacturing high-precision optical components used in space-based electrooptic systems for scientific research and Earth remote sensing. It presents an integrated process for automatic shaping (TESAF) of aspheric surfaces, including off-axis surfaces, of optical elements for electrooptic systems. This paper discusses various methods for shaping optical parts with virtually any degree of asphericity and various values of the off-axis parameter (off-axis aspherics) achieving surface shape precision to within λ/60…λ/80 (λ = 0.6328 micron) by the standard deviation criteria. The paper also presents the newly developed off-axis collimators, designed to shape a reference wavefront within a broad spectral range from ultraviolet to infrared radiation. In particular, a mirror collimator with an adaptive off-axis mirror that is capable of changing the wavefront that is being formed in order to obtain the response function of the electrooptical system under study. Optical systems built using the TESAF process are already successfully used. Key words: surface shaping, aspheric surface, surface interferogram, standard deviation.


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