scholarly journals Color filters including infrared cut-off integrated on CMOS image sensor

2011 ◽  
Vol 19 (14) ◽  
pp. 13073 ◽  
Author(s):  
Laurent Frey ◽  
Pascale Parrein ◽  
Jacques Raby ◽  
Catherine Pellé ◽  
Didier Hérault ◽  
...  
Nano Letters ◽  
2017 ◽  
Vol 17 (5) ◽  
pp. 3159-3164 ◽  
Author(s):  
Yu Horie ◽  
Seunghoon Han ◽  
Jeong-Yub Lee ◽  
Jaekwan Kim ◽  
Yongsung Kim ◽  
...  

2021 ◽  
Vol 29 (3) ◽  
pp. 3643
Author(s):  
Jongwoo Hong ◽  
Hyunwoo Son ◽  
Changhyun Kim ◽  
Sang-Eun Mun ◽  
Jangwoon Sung ◽  
...  

2016 ◽  
Vol 24 (14) ◽  
pp. 16027 ◽  
Author(s):  
Jong-Kwon Lee ◽  
Ahreum Kim ◽  
Dong-Wan Kang ◽  
Byung Yang Lee

Nano Letters ◽  
2012 ◽  
Vol 12 (8) ◽  
pp. 4349-4354 ◽  
Author(s):  
Sozo Yokogawa ◽  
Stanley P. Burgos ◽  
Harry A. Atwater

2017 ◽  
Vol 137 (2) ◽  
pp. 48-58
Author(s):  
Noriyuki Fujimori ◽  
Takatoshi Igarashi ◽  
Takahiro Shimohata ◽  
Takuro Suyama ◽  
Kazuhiro Yoshida ◽  
...  

2020 ◽  
Vol 2020 (7) ◽  
pp. 143-1-143-6 ◽  
Author(s):  
Yasuyuki Fujihara ◽  
Maasa Murata ◽  
Shota Nakayama ◽  
Rihito Kuroda ◽  
Shigetoshi Sugawa

This paper presents a prototype linear response single exposure CMOS image sensor with two-stage lateral overflow integration trench capacitors (LOFITreCs) exhibiting over 120dB dynamic range with 11.4Me- full well capacity (FWC) and maximum signal-to-noise ratio (SNR) of 70dB. The measured SNR at all switching points were over 35dB thanks to the proposed two-stage LOFITreCs.


Author(s):  
Benedict Drevniok ◽  
St. John Dixon-Warren ◽  
Oskar Amster ◽  
Stuart L Friedman ◽  
Yongliang Yang

Abstract Scanning microwave impedance microscopy was used to analyze a CMOS image sensor sample to reveal details of the dopant profiling in planar and cross-sectional samples. Sitespecific capacitance-voltage spectroscopy was performed on different regions of the samples.


2014 ◽  
Vol 35 (3) ◽  
pp. 035005 ◽  
Author(s):  
Kaiming Nie ◽  
Suying Yao ◽  
Jiangtao Xu ◽  
Zhaorui Jiang

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