scholarly journals Enhancement of Emission Intensity of Y3Al5O12:Ce3+ Phosphor by Surface Modification of Wet Etching

2012 ◽  
Author(s):  
Zhijiang He ◽  
Qiongrong Ou ◽  
Rongqing Liang
Keyword(s):  
Surface Modification ◽  
Emission Intensity ◽  
Wet Etching

Top down nano technologies in surface modification of materials

Open Physics ◽  
2011 ◽  
Vol 9 (2) ◽  
Author(s):  
Branislav Radjenović ◽  
Marija Radmilović-Radjenović
Keyword(s):  
Surface Modification ◽  
Three Dimensional ◽  
Wet Etching ◽  
Plasma Reactors ◽  
Top Down ◽  
Isotropic Etching ◽  
Microelectronic Devices ◽  
Etching Profile ◽  
Simulation Results ◽  
Low K

AbstractThis article contains a broad overview of etch process as one of the most important top-down technologies widely used in semiconductor manufacturing and surface modification of nanostructures. In plasma etching process, the complexity comes from the introduction of new materials and from the constant reduction in dimensions of the structures in microelectronics. The emphasis was made on two types of etching processes: dry etching and wet etching illustrated by three dimensional (3D) simulation results for the etching profile evolution based on the level set method. The etching of low-k dielectrics has been demonstrated via modelling the porous materials. Finally, simulation results for the roughness formation during isotropic etching of nanocomposite materials as well as smoothing of the homogeneous materials have also been shown and analyzed. Simulation results, presented here, indicate that with shrinking microelectronic devices, plasma and wet etching interpretative and predictive modeling and simulation have become increasingly more attractive as a tool for design, control and optimization of plasma reactors.

PHOTOLUMINESCENCE ENHANCEMENT AND THERMAL PERFORMANCE OF SURFACE MODIFIED Y3Al5O12:Ce3+ PHOSPHOR BY CHEMICAL WET ETCHING

2013 ◽  
Vol 06 (01) ◽  
pp. 1350008 ◽  
Author(s):  
ZHIJIANG HE ◽  
ZEBIN LI ◽  
XIAOXUAN FAN ◽  
WEIHAI CHENG ◽  
JIAQI JU ◽  
...  
Keyword(s):  
Surface Modification ◽  
Decay Rate ◽  
Thermal Performance ◽  
Smooth Surface ◽  
Wet Etching ◽  
Emission Power ◽  
Temperature Decay ◽  
Photoluminescence Enhancement ◽  
Lower Temperature ◽  
Surface Modified

Surface of Y3Al5O12 : Ce3+ Phosphor was modified by wet etching in 40% NH4F+CH3COOH (1:1) solution for 5 h. SEM results show that smooth surface of phosphor particles turn rough, and edge angles are less sharp as before. PL determinations indicate that backscattering loss of the excited light reduces by 3.9% and emission power is enhanced by 10.7%. Meanwhile, after the surface modification, YAG phosphor presents a lower temperature decay rate of 1.2% at 373 K, which is well explained by the configurational coordinate diagram. Therefore, this method can greatly enhance the efficient of light conversion, extraction and stabilization of pc-LED.

Surface modification of Y3Al5O12:Ce3+ phosphor by hydrofluoric acid wet etching

2013 ◽  
Vol 136 ◽  
pp. 351-354 ◽  
Author(s):  
Zhijiang He ◽  
Weihai Cheng ◽  
Zebin Li ◽  
Ying Liu ◽  
Qiongrong Ou ◽  
...  
Keyword(s):  
Surface Modification ◽  
Hydrofluoric Acid ◽  
Wet Etching

Surface Modification of PMMA by Ion Irradiation

2012 ◽  
Vol 132 (3) ◽  
pp. 227-232
Author(s):  
Junya Yokoyama ◽  
Toru Iwao ◽  
Motoshige Yumoto
Keyword(s):  
Surface Modification ◽  
Ion Irradiation

Surface Modification of Casting Al-Alloy by Plasma-Based Ion Implantation

2001 ◽  
Vol 121 (4) ◽  
pp. 372-377
Author(s):  
Tetsuji Yamanishi ◽  
Yoshihito Hara ◽  
Kingo Azuma ◽  
Etsuo Fujiwara ◽  
Mitsuyasu Yatsuzuka
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Al Alloy
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