Some Observations on Variations in Line Intensity with ARC Plasma Temperature

1976 ◽  
Vol 257O (1) ◽  
Author(s):  
M. I. Nasser ◽  
A. B. Basily
Keyword(s):  
Line Intensity ◽  
Plasma Temperature ◽  
Arc Plasma

The Performance of Plasma and Multi-Physical Fields in DC Arc Plasma Reactor for CVD Diamond Film

2016 ◽  
Vol 852 ◽  
pp. 1140-1146
Author(s):  
Xiao Jing Li ◽  
Yong Liang Gao ◽  
Yan Yin ◽  
Shun Qi Zheng ◽  
Yang Sheng Zheng
Keyword(s):  
Diamond Film ◽  
Gas Flow ◽  
Plasma Reactor ◽  
Plasma Temperature ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Arc Plasma ◽  
Cvd Diamond Film ◽  
Physical Fields ◽  
Dc Arc

Numerical simulation method was developed to investigate the performance of plasma and multi-physical fields in direct current (DC) arc plasma reactor for chemical vapor deposition (CVD) Diamond film,in order to obtain more information on the process of CVD. Finite Volume Method (FVM) was adopted. Continuous arc forming and the dynamic formation process of rotating arc plasma were shown in this paper. Multi-physics field in deposition chamber were modeled including flow field, temperature field. Distribution of velocity and temperature were obtained by solving momentum and energy equation with SIMPLE separation algorithm. Simulation results show that, plasma temperature near the cathode tip is the highest, which is more than 1×104K. The plasma distribution shape like the bell jar. The changing regularity of outlet velocity, temperature and static pressure with the distance from the anode center were revealed. The effectiveness of plasma temperature and gas flow calculated was confirmed by the experimental results. The research results provide the theoretical foundation for obtaining uniform diamond thick film.

Design on Arc Plasma Temperature Online Detecting System

2013 ◽  
Vol 325-326 ◽  
pp. 1427-1430
Author(s):  
Chun Guang Hou ◽  
Shi Yu Zhang ◽  
Yun Dong Cao ◽  
Shu Xin Liu
Keyword(s):  
Optical Fibers ◽  
High Speed ◽  
Shape Change ◽  
Sampling Rate ◽  
Circuit Breaker ◽  
Plasma Temperature ◽  
Electric Arc ◽  
Space Distribution ◽  
Arc Plasma ◽  
Arc Shape

Aiming at the arc plasma characteristics of high voltage circuit breaker, a set of multichannel, high speed, the synchronous detecting system is designed. The space distribution and time variation law of electric arc plasma, specially electric arc shape change law, are well reflected. Based on the ARM + CPLD + SDRAM detecting schemes, the system realized the functions of 64 groups optical fibers sampling, 4M/s sampling rate of every sampling channel, and the synchronous sampling. Through the detailed research and design to EMC, system error analysis, visual interface and database as well as the related interface program of ARM, CPLD, SDRAM and so on, has completed the multichannel, high speed and the real-time synchronized sampling, and mass data memory, computation, analysis, curve and animation demonstration and so on functions. The stability, feasibility and accuracy of the detecting system are proved by the practical application.

scholarly journals Numerical Analysis of the Correlation between Arc Plasma Fluctuation and Nanoparticle Growth–Transport under Atmospheric Pressure

Nanomaterials ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 1736 ◽  
Author(s):  
Masaya Shigeta ◽  
Manabu Tanaka ◽  
Emanuele Ghedini
Keyword(s):  
Temperature Fluctuation ◽  
Dynamic Instability ◽  
Fluid Dynamic ◽  
Computational Cost ◽  
Plasma Temperature ◽  
Particle Growth ◽  
Accurate Method ◽  
Arc Plasma ◽  
Particle Distributions ◽  
Plasma Fluctuation

A time-dependent two-dimensional (2D) axisymmetric simulation was conducted for arc plasma with dynamically fluctuating fluid generating iron nanoparticles in a direct-current discharge condition. The nonequilibrium process of simultaneous growth and transport of nanoparticles is simulated using a simple model with a low computational cost. To ascertain fluid dynamic instability and steep gradients in plasma temperature and particle distributions, a highly accurate method is adopted for computation. The core region of the arc plasma is almost stationary, whereas the fringe fluctuates because of fluid dynamic instability between the arc plasma and the shielding gas. In the downstream region, the vapor molecules decrease by condensation. The nanoparticles decrease by coagulation. These results suggest that both of the simultaneous processes make important contributions to particle growth. The fluctuation of nanoparticle number density in a distant region exhibits stronger correlation with the temperature fluctuation at the plasma fringe. The correlation analysis results suggest that the distribution of growing nanoparticles distant from the arc plasma can be controlled via control of temperature fluctuation at the arc plasma fringe.

scholarly journals Influence of metal vapours on radiation characteristics of air arc plasmas

2020 ◽  
Vol 7 (2) ◽  
pp. 30-35
Author(s):  
Milada Bartlová ◽  
Petr Kloc ◽  
Vladimír Aubrecht ◽  
Nadezda Bogatyreva
Keyword(s):  
Temperature Profile ◽  
Radiation Flux ◽  
Radiation Transfer ◽  
Plasma Temperature ◽  
Arc Plasma ◽  
Radiation Characteristics ◽  
Plasma Cylinder ◽  
Radiation Properties ◽  
Isothermal Plasma ◽  
Arc Plasmas

This paper deals with the evaluation of radiation properties of air arc plasma with various admixtures of Cu, Ag, and Fe, respectively. Under assumption of isothermal plasma cylinder, the net emission coefficients were calculated for various arc radii as a function of the plasma temperature up to 30000K. For plasma with prescribed temperature profile, the equation of radiation transfer was solved in the P1approximation, and the radiation flux and its divergence were calculated.

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