Single-trap kinetic in Si nanowire FETs: effect of gamma radiation treatment

MRS Advances ◽  
2016 ◽  
Vol 1 (56) ◽  
pp. 3755-3760 ◽  
Author(s):  
I. Zadorozhnyi ◽  
J. Li ◽  
S. Pud ◽  
M. Petrychuk ◽  
S. Vitusevich

ABSTRACTHere we report on the effect of gamma radiation treatment on transport properties and single-trap kinetics in Si nanowire (NW) field effect transistor (FET) structures. We used noise spectroscopy as a powerful method for advanced physical characterization of nanoscale devices. Our results demonstrate that transport properties of NW FETs can be changed using small doses of gamma radiation treatment. We reveal an enhancement of the gate coupling effect, which is explained as a result of the reorganization of the native defect structure after treatment. The radiation treatment approach allows the single-trap dynamic to be changed, which opens up prospects for a number of fundamental studies and applications of Si NW FET device structures, including biosensors.

2013 ◽  
Author(s):  
Anton Vladyka ◽  
Viktor Sydoruk ◽  
Svetlana Vitusevich ◽  
Mykhailo Petrychuk ◽  
Dong Xiang ◽  
...  

2017 ◽  
pp. 737-748
Author(s):  
Yoon-Ha Jeong ◽  
Sang-Hyun Lee ◽  
Ye-Ram Kim ◽  
Rock-Hyun Baek ◽  
Dong-Won Kim ◽  
...  

2013 ◽  
Vol 114 (20) ◽  
pp. 203704 ◽  
Author(s):  
J. Li ◽  
S. A. Vitusevich ◽  
M. V. Petrychuk ◽  
S. Pud ◽  
A. Offenhäusser ◽  
...  

Author(s):  
Firas Natheer Abdul-Kadir ◽  
Yasir Hashim ◽  
Muhammad Nazmus Shakib ◽  
Faris Hassan Taha

This research paper explains the effect of the dimensions of Gate-all-around Si nanowire tunneling field effect transistor (GAA Si-NW TFET) on ON/OFF current ratio, drain induces barrier lowering (DIBL), sub-threshold swing (SS), and threshold voltage (VT). These parameters are critical factors of the characteristics of tunnel field effect transistors. The Silvaco TCAD has been used to study the electrical characteristics of Si-NW TFET. Output (gate voltage-drain current) characteristics with channel dimensions were simulated. Results show that 50nm long nanowires with 9nm-18nm diameter and 3nm oxide thickness tend to have the best nanowire tunnel field effect transistor (Si-NW TFET) characteristics.


2013 ◽  
Author(s):  
Jing Li ◽  
Svetlana Vitusevich ◽  
Mykhailo Petrychuk ◽  
Sergii Pud ◽  
Viktor Sydoruk ◽  
...  

2010 ◽  
Vol 107 (6) ◽  
pp. 063701 ◽  
Author(s):  
S. A. Vitusevich ◽  
V. A. Sydoruk ◽  
M. V. Petrychuk ◽  
B. A. Danilchenko ◽  
N. Klein ◽  
...  

2021 ◽  
Author(s):  
Dongha Shin ◽  
Hwa Rang Kim ◽  
Byung Hee Hong

Since of its first discovery, graphene has attracted much attention because of the unique electrical transport properties that can be applied to high-performance field-effect transistor (FET). However, mounting chemical functionalities...


Sign in / Sign up

Export Citation Format

Share Document