Photoluminescence of mesoporous silica films impregnated with an erbium complex

2003 ◽  
Vol 18 (5) ◽  
pp. 1039-1042 ◽  
Author(s):  
Oun-Ho Park ◽  
Se-Young Seo ◽  
Ji-In Jung ◽  
Jae Young Bae ◽  
Byeong-Soo Bae
Keyword(s):  
Mesoporous Silica ◽  
Spin Coating ◽  
Room Temperature ◽  
Sol Gel ◽  
Silicon Wafers ◽  
Silica Films ◽  
Room Temperature Photoluminescence

Transparent mesoporous silica films were prepared by sol-gel spin coating on silicon wafers at room temperature. An erbium complex, erbium tris 8-hydroxyquinoline (ErQ), was homogeneously impregnated into the pores of the mesoporous silica films, and its concentration was easily controlled by using a solution immersing technique. The ErQ-impregnated mesoporous silica films show a room-temperature photoluminescence at 1.5 µm.

Sol–gel derived mesoporous silica films using amphiphilic triblock copolymers

2003 ◽  
Vol 332 (1-3) ◽  
pp. 199-206 ◽  
Author(s):  
Nobuaki Kitazawa ◽  
Hideyoshi Namba ◽  
Masami Aono ◽  
Yoshihisa Watanabe
Keyword(s):  
Mesoporous Silica ◽  
Triblock Copolymers ◽  
Sol Gel ◽  
Silica Films

ChemInform Abstract: Sol-Gel-Derived Mesoporous Silica Films with Low Dielectric Constants.

ChemInform ◽  
2001 ◽  
Vol 32 (10) ◽  
pp. no-no
Author(s):  
Seana Seraji ◽  
Yun Wu ◽  
Michael Forbess ◽  
Steven J. Limmer ◽  
Tammy Chou ◽  
...  
Keyword(s):  
Mesoporous Silica ◽  
Sol Gel ◽  
Dielectric Constants ◽  
Silica Films ◽  
Low Dielectric

ChemInform Abstract: Insulating Ultrathin Silica Films Formed by a Room-Temperature Sol-Gel Process.

ChemInform ◽  
2010 ◽  
Vol 32 (34) ◽  
pp. no-no
Author(s):  
Joseph W. Robertson ◽  
Mei Cai ◽  
Jeanne E. Pemberton
Keyword(s):  
Room Temperature ◽  
Sol Gel ◽  
Silica Films ◽  
Sol Gel Process

Visible room-temperature photoluminescence of Ge-doped SiO2 glasses fabricated by a sol–gel process

2007 ◽  
Vol 29 (6) ◽  
pp. 631-635 ◽  
Author(s):  
Heqing Yang ◽  
Xi Yao ◽  
Xingjun Wang ◽  
Xiaoxiao Gu ◽  
Fujian Wang
Keyword(s):  
Room Temperature ◽  
Sol Gel ◽  
Room Temperature Photoluminescence ◽  
Sol Gel Process

Facile route to tin oxide containing mesoporous silica composites with room-temperature photoluminescence

2006 ◽  
Vol 21 (3) ◽  
pp. 655-663 ◽  
Author(s):  
Zhicheng Liu ◽  
Hangrong Chen ◽  
Weiming Huang ◽  
Jinlou Gu ◽  
Wenbo Bu ◽  
...  
Keyword(s):  
Mesoporous Silica ◽  
Tin Oxide ◽  
Room Temperature ◽  
Uv Light ◽  
Treatment Method ◽  
Preparation Temperature ◽  
Strong Emission ◽  
Room Temperature Photoluminescence ◽  
Near Ultraviolet ◽  
Facile Route

In this paper, we report a facile route, the tin vapor treatment method, to prepare tin oxide containing mesoporous silica composites (TOMS), which display room-temperature photoluminescence (RT-PL). Among them, TOMS-1 and TOMS-2 were synthesized from mesoporous silica SBA-15 and KIT-6, respectively. They are composed of amorphous SiO2 and tin oxide species and they display strong emission near ultraviolet (UV) when excited by UV light. By increasing the preparation temperature, their Sn content can be increased and subsequently their photoluminescence (PL) intensities can be greatly enhanced. Besides, their PL properties are revealed to be closely related to 2-fold-coordinated tin oxygen-deficient centers.

Microstructural Analysis of Disordered and Ordered Mesoporous Silica Films

1998 ◽  
Vol 4 (S2) ◽  
pp. 726-727
Author(s):  
C. A. Drewien ◽  
Y. Lu ◽  
C. J. Brinker ◽  
R. Ganguli ◽  
M. T. Anderson
Keyword(s):  
Mesoporous Silica ◽  
Pore Size ◽  
Size Structure ◽  
Sol Gel ◽  
Microstructural Analysis ◽  
Dip Coating ◽  
Inorganic Membranes ◽  
Cross Sectional ◽  
Silica Films ◽  
Plan View

Processing can be controlled to produce a family of mesoporous silica films with either disordered, lamellar, hexagonal, or cubic pore distributions[l]. These films, formed by surfactant-templated synthesis and exhibiting a unimodal pore size, promise potential use as inorganic membranes, catalysts, and optically-based sensors[l,2]. The mesoporous films can be formed from initially homogeneous silica sols by a continuous, surfactant-templated process, which relies upon solvent evaporation during the sol-gel dip-coating process. Films of 100-500 nm thick are formed within seconds in a continuous coating operation. The microstructure of the films is dependent upon the cationic surfactant concentration CTAB (CH3(CH2)15N+(CH3)3Br-) and the dip-coating rate. Several films, processed under differing conditions, were investigated by TEM to characterize pore size, structure, and orientation.Figures 1 a & b show the plan view and cross-sectional microstructure of a 2-d hexagonal mesoporous silica film deposited on silicon; the sample was calcined at 400 °C for 3 hours in air. The images were obtained on a Philips CM30 TEM, operated at 300 kV.

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