scholarly journals Diffraction Microscopy using 20-kV Electron Beam for Multi-Wall Carbon Nanotubes

2007 ◽  
Vol 1026 ◽  
Author(s):  
Osamu Kamimura ◽  
Kota Kawahara ◽  
Takahisa Doi ◽  
Takashi Dobashi ◽  
Takashi Abe ◽  
...  

AbstractDiffraction microscopy (or diffractive imaging) with iterative phase retrieval was performed using a low-energy (20-keV) electron beam to verify the possibility of high-resolution imaging with low specimen damage. Diffraction patterns of fine and uniform multi-wall carbon nanotubes (MWCNT) were recorded without a post-specimen lens. One- and two-dimensional phase retrievals were processed from the diffraction pattern alone. The reconstructed object images reflected the characteristic structure of the MWCNT. These results show the possibility of high-resolution imaging with a low-energy electron beam.

Author(s):  
George C. Ruben

Single molecule resolution in electron beam sensitive, uncoated, noncrystalline materials has been impossible except in thin Pt-C replicas ≤ 150Å) which are resistant to the electron beam destruction. Previously the granularity of metal film replicas limited their resolution to ≥ 20Å. This paper demonstrates that Pt-C film granularity and resolution are a function of the method of replication and other controllable factors. Low angle 20° rotary , 45° unidirectional and vertical 9.7±1 Å Pt-C films deposited on mica under the same conditions were compared in Fig. 1. Vertical replication had a 5A granularity (Fig. 1c), the highest resolution (table), and coated the whole surface. 45° replication had a 9Å granulartiy (Fig. 1b), a slightly poorer resolution (table) and did not coat the whole surface. 20° rotary replication was unsuitable for high resolution imaging with 20-25Å granularity (Fig. 1a) and resolution 2-3 times poorer (table). Resolution is defined here as the greatest distance for which the metal coat on two opposing faces just grow together, that is, two times the apparent film thickness on a single vertical surface.


Author(s):  
Bertholdand Senftinger ◽  
Helmut Liebl

During the last few years the investigation of clean and adsorbate-covered solid surfaces as well as thin-film growth and molecular dynamics have given rise to a constant demand for high-resolution imaging microscopy with reflected and diffracted low energy electrons as well as photo-electrons. A recent successful implementation of a UHV low-energy electron microscope by Bauer and Telieps encouraged us to construct such a low energy electron microscope (LEEM) for high-resolution imaging incorporating several novel design features, which is described more detailed elsewhere.The constraint of high field strength at the surface required to keep the aberrations caused by the accelerating field small and high UV photon intensity to get an improved signal-to-noise ratio for photoemission led to the design of a tetrode emission lens system capable of also focusing the UV light at the surface through an integrated Schwarzschild-type objective. Fig. 1 shows an axial section of the emission lens in the LEEM with sample (28) and part of the sample holder (29). The integrated mirror objective (50a, 50b) is used for visual in situ microscopic observation of the sample as well as for UV illumination. The electron optical components and the sample with accelerating field followed by an einzel lens form a tetrode system. In order to keep the field strength high, the sample is separated from the first element of the einzel lens by only 1.6 mm. With a numerical aperture of 0.5 for the Schwarzschild objective the orifice in the first element of the einzel lens has to be about 3.0 mm in diameter. Considering the much smaller distance to the sample one can expect intense distortions of the accelerating field in front of the sample. Because the achievable lateral resolution depends mainly on the quality of the first imaging step, careful investigation of the aberrations caused by the emission lens system had to be done in order to avoid sacrificing high lateral resolution for larger numerical aperture.


Carbon ◽  
2004 ◽  
Vol 42 (12-13) ◽  
pp. 2527-2533 ◽  
Author(s):  
Pedro M.F.J. Costa ◽  
Steffi Friedrichs ◽  
Jeremy Sloan ◽  
Malcolm L.H. Green

2000 ◽  
Vol 41 (1) ◽  
pp. 64-66
Author(s):  
S. Ohtsuka ◽  
Y. Sugishita ◽  
T. Takeda ◽  
Y. Itai ◽  
J. Tada ◽  
...  

2010 ◽  
Vol 16 (S2) ◽  
pp. 614-615 ◽  
Author(s):  
JR Michael ◽  
DC Joy ◽  
BJ Griffin

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.


2000 ◽  
Vol 41 (1) ◽  
pp. 64-66 ◽  
Author(s):  
S. Ohtsuka ◽  
Y. Sugishita ◽  
T. Takeda ◽  
Y. Itai ◽  
J. Tada ◽  
...  

2000 ◽  
Vol 41 (1) ◽  
pp. 64-66
Author(s):  
S. Ohtsuka ◽  
Y. Sugishita ◽  
T. Takeda ◽  
Y. Itai ◽  
J. Tada ◽  
...  

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