Localized56Fe+ion implantation of TiO2using anodic porous alumina

2009 ◽  
Vol 1181 ◽  
Author(s):  
Jens Jensen ◽  
Ruy Sanz ◽  
Mirian Jaafar ◽  
Manuel Hernández-Vélez ◽  
Agustina Asenjo ◽  
...  

AbstractWe present result following localized ion implantation of rutile titanium dioxide (TiO2) using anodic porous alumina as a mask. The implantation were performed with 100 keV56Fe+ions using a fluence of 1.3·1016ions/cm2. The surface modifications where studied by means of SEM, AFM/MFM and XRD. A well-defined hexagonal pattern of modified material in the near surface structure is observed. Local examination of the implanted areas revealed no clear magnetic signal. However, a variation in mechanical and electrostatic behavior between implanted and non-implanted zones is inferred from the variation in AFM signals.

2008 ◽  
Vol 33 (4) ◽  
pp. 1011-1014
Author(s):  
Masahide Nakamura ◽  
Seisuke Nigo ◽  
Naoki Kishimoto

2003 ◽  
Vol 93 (9) ◽  
pp. 5156-5160 ◽  
Author(s):  
T. Umebayashi ◽  
T. Yamaki ◽  
S. Yamamoto ◽  
A. Miyashita ◽  
S. Tanaka ◽  
...  

2021 ◽  
Vol 11 (4) ◽  
pp. 1196
Author(s):  
Yujie Ma ◽  
Cangtao Zhou ◽  
Bingxi Xiang ◽  
Mingyang Yu ◽  
Fei Lu ◽  
...  

Author(s):  
John D. Rubio

The degradation of steam generator tubing at nuclear power plants has become an important problem for the electric utilities generating nuclear power. The material used for the tubing, Inconel 600, has been found to be succeptible to intergranular attack (IGA). IGA is the selective dissolution of material along its grain boundaries. The author believes that the sensitivity of Inconel 600 to IGA can be minimized by homogenizing the near-surface region using ion implantation. The collisions between the implanted ions and the atoms in the grain boundary region would displace the atoms and thus effectively smear the grain boundary.To determine the validity of this hypothesis, an Inconel 600 sample was implanted with 100kV N2+ ions to a dose of 1x1016 ions/cm2 and electrolytically etched in a 5% Nital solution at 5V for 20 seconds. The etched sample was then examined using a JEOL JSM25S scanning electron microscope.


Author(s):  
D.I. Potter ◽  
M. Ahmed ◽  
K. Ruffing

Ion implantation, used extensively for the past decade in fabricating semiconductor devices, now provides a unique means for altering the near-surface chemical compositions and microstructures of metals. These alterations often significantly improve physical properties that depend on the surface of the material; for example, catalysis, corrosion, oxidation, hardness, friction and wear. Frequently the mechanisms causing these beneficial alterations and property changes remain obscure and much of the current research in the area of ion implantation metallurgy is aimed at identifying such mechanisms. Investigators thus confront two immediate questions: To what extent is the chemical composition changed by implantation? What is the resulting microstructure? These two questions can be investigated very fruitfully with analytical electron microscopy (AEM), as described below.


2016 ◽  
Vol 213 (8) ◽  
pp. 2044-2050 ◽  
Author(s):  
Felipe Fávaro de Oliveira ◽  
Seyed Ali Momenzadeh ◽  
Denis Antonov ◽  
Helmut Fedder ◽  
Andrej Denisenko ◽  
...  

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