Metastable Nanocrystalline Carbides in Chemically Synthesized W-Co-C Ternary Alloys

1988 ◽  
Vol 132 ◽  
Author(s):  
L. E. McCandlish ◽  
B. H. Kear ◽  
B. K. Kim ◽  
L. W. wu

ABSTRACTNanophase materials can be prepared either by physical methods or chemical methods. Physical methods include thermal evaporation, sputtering and melt quenching, whereas chemical methods include glow-discharge decomposition, chemical vapor deposition, sol-gel dehydration and gas-solid reaction. Recently, we have used controlled activity gassolid reactions to prepare nanophase WC-Co cermet powders at different WC loadings. In the process we have discovered some new metastable phases in the W-Co-C ternary system at temperatures below 1000 °C.

1994 ◽  
Vol 346 ◽  
Author(s):  
R.K. Shibao ◽  
V.I. Srdanov ◽  
M. Hay ◽  
H. Eckert

ABSTRACTAmorphous SiSx:H (x ∼ 2) films have been synthesized from H2S and SiH4 precursors using a remote plasma enhanced chemical vapor deposition apparatus. Structural studies by solid state nuclear magnetic resonance (NMR) and Raman scattering reveal that the atomic environments in these materials are similar to those observed in melt-quenched silicon sulfide glasses, and are characterized by corner- and edge-shared SiS4/2 tetrahedra. Compared to these glasses, however, the films show consistently higher fractions of corner-sharing S1S4/2 tetrahedra. The ratio of corner- to edge sharing tetrahedra and the Si:S ratio can be influenced by the H2S/S1H4 flow rate ratio during deposition. Thus, PECVD opens up wider opportunities for structural tailoring of amorphous silicon sulfide materials than currently possible by means of the melt-quenching method. Preliminary data for the PECVD synthesis of phosphorus sulfide is also presented.


2003 ◽  
Vol 784 ◽  
Author(s):  
Taisuke Furukawa ◽  
Takeharu Kuroiwa ◽  
Yoshihisa Fujisaki ◽  
Takehiko Sato ◽  
Hiroshi Ishiwara

ABSTRACTA Ru/ Bi 4-xLaxTi 3O12/Ru (Ru/BLT/Ru) capacitor structure with Ru top electrodes deposited by metalorganic chemical vapor deposition (MOCVD) was fabricated. On a Ru film deposited by MOCVD, BLT film was formed by a sol-gel method and crystallized in vacuum. Depositing a conformal Ru film on a BLT/Ru structure by MOCVD, Ru/BLT/Ru stack with smooth and flat surface was successfully formed. Then, ferroelectric Ru/BLT/Ru capacitors were fabricated through a dry etching process. It exhibited both good ferroelectric properties (2Pr =16 μC/cm2) and low leakage current density (J =10−7 A/cm2), suggesting that Ru film deposited by MOCVD showed sufficient properties for the tope electrode of Ru/BLT/Ru structures.


2000 ◽  
Vol 616 ◽  
Author(s):  
G. Grandinetti ◽  
S. Shanmugham ◽  
M.R. Hendrick ◽  
J.M. Hampikian

Abstractα-Alumina films are useful for high-temperature, wear, and semiconductor device applications because of their good oxidation resistance, high hardness values, and electrical properties. α-Alumina films have been previously synthesized using techniques such as chemical vapor deposition, sol-gel, physical vapor deposition, and plasma spraying. This paper presents an alternative approach for producing high quality dense α-alumina coatings using a flame-assisted process called combustion chemical vapor deposition (CCVD). This process is an open atmosphere technique that does not require the use of a reaction chamber. In this work alumina films were grown on YSZ at temperatures ranging from 900 to 1500°C. At lower temperatures only amorphous alumina was grown, but as the deposition temperature increased different alumina phases were formed. At 1100°C, a thin highly crystalline θ-Al2O3 coating was formed. At temperatures higher than 1100°C thick θ-Al2O3 coatings were deposited on the YSZ. Coatings were characterized by scanning electron microscopy (SEM) and x-ray diffraction (XRD).


Materials ◽  
2020 ◽  
Vol 13 (11) ◽  
pp. 2468 ◽  
Author(s):  
Krzysztof Rokosz ◽  
Tadeusz Hryniewicz ◽  
Łukasz Dudek

This paper shows that the subject of porous coatings fabrication by Plasma Electrolytic Oxidation (PEO), known also as Micro Arc Oxidation (MAO), is still current, inter alia because metals and alloys, which can be treated by the PEO method, for example, titanium, niobium, tantalum and their alloys, are increasingly available for sale. On the international market, apart from scientific works/activity developed at universities, scientific research on the PEO coatings is also underway in companies such as Keronite (Great Britain), Magoxid-Coat (Germany), Mofratech (France), Machaon (Russia), as well as CeraFuse, Tagnite, Microplasmic (USA). In addition, it should be noted that the development of the space industry and implantology will force the production of trouble-free micro- and macro-machines with very high durability. Another aspect in favor of this technique is the rate of part treatment, which does not exceed several dozen minutes, and usually only lasts a few minutes. Another advantage is functionalization of fabricated surface through thermal or hydrothermal modification of fabricated coatings, or other methods (Physical vapor deposition (PVD), chemical vapor deposition (CVD), sol-gel), including also reoxidation by PEO treatment in another electrolyte. In the following chapters, coatings obtained both in aqueous solutions and electrolytes based on orthophosphoric acid will be presented; therein, dependent on the PEO treatment and the electrolyte used, they are characterized by different properties associated with their subsequent use. The possibilities for using coatings produced by means of plasma electrolytic oxidation are very wide, beginning from various types of catalysts, gas sensors, to biocompatible and antibacterial coatings, as well as hard wear coatings used in machine parts, among others, used in the aviation and aerospace industries.


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