Surface Oxidation Processes in Compound Semiconductors Studied by Profile Imaging

1989 ◽  
Vol 139 ◽  
Author(s):  
Ping Lu ◽  
David J. Smith
2018 ◽  
Vol 91 ◽  
pp. 659-668 ◽  
Author(s):  
Nezha Ahmad Agha ◽  
Zhidan Liu ◽  
Frank Feyerabend ◽  
Regine Willumeit-Römer ◽  
Billiana Gasharova ◽  
...  

2018 ◽  
Vol 282 ◽  
pp. 39-42 ◽  
Author(s):  
Sang Woo Lim

The integration of III-V and Ge materials on Si surface causes many issues with complexity such as lattice mismatch with silicon. In particular, the surface preparation and passivation of InGaAs is very challenging, because the formation of InGaAs/high-K interface is important, but not well understood. For the systematical study of InGaAs surface during wet processes, the effect of various wet etching processes on the surfaces of binary III-V compound semiconductors (GaAs, InAs, GaSb and InSb) was studied from the viewpoints of surface oxidation, material loss (dissolution), and passivation. Based on that, further effort to understand the surface reactions on ternary InGaAs compound semiconductor was made. In addition, process sequential effect on the InGaAs surface was investigated.


ACS Sensors ◽  
2018 ◽  
Vol 3 (11) ◽  
pp. 2254-2260 ◽  
Author(s):  
Konrad Maier ◽  
Andreas Helwig ◽  
Gerhard Müller ◽  
Jörg Schörmann ◽  
Martin Eickhoff

2000 ◽  
Vol 72 (11) ◽  
pp. 2101-2110 ◽  
Author(s):  
Jürgen Warnatz

The exact knowledge of hydrocarbon oxidation kinetics is very important due to the fact that this process is involved in many technological processes: combustion in engines and furnaces, flame synthesis of materials, partial oxidation processes in chemical technology, catalytic combustion, and exhaust gas treatment, etc. An overview is given on the present state of the art with respect to kinetic data on gas-phase and (shortly) surface oxidation of hydrocarbons. Furthermore, some applications are described in the areas mentioned above. Examples for the importance of the gas-phase oxidation of hydrocarbons are ignition and combustion in engines and furnaces and partial oxidation processes in industrial chemical reactors. In many applications, both gas-phase and surface chemistry are taking place. Examples here are flame generation of diamonds and syngas generation.


1998 ◽  
Vol 102 (41) ◽  
pp. 8042-8048 ◽  
Author(s):  
Kazuya Watanabe ◽  
Hiroyuki Kato ◽  
Yoshiyasu Matsumoto

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