Substrate-Deposition-Teiimperatijre Dependence of Perpendicular Magnetic Anisotropy in (Fe/Pt) Compositionally-Modulated Films

1991 ◽  
Vol 232 ◽  
Author(s):  
S. Iwata ◽  
S. S. P. Parkin ◽  
H. Nuri ◽  
T. Suzuki

ABSTRACTA systematic study on magnetic properties of (Fc/Pt) compositionally-modulated films as a function of substrate-deposition-temperature has been carried out. For films with (2.5ÅFe/18ÅPt)×40, the intrinsic perpendicular magnetic anisotropy Ku is found to increase with decreasing temperature for all the sarmples deposited at temperatures from -114 °C to 220°C during deposition. The higher the substrate-deposition-temperature, the larger the Ku values become. This result implies a possible contribution from the magne to-elastic effect to the total anisotropy. However, a major part responsible for the perpendicular anisotropy may be found in other mechanisms. The saturation magnetization is found to exceed the value for pure Fe at temperatures lower than 180K.

SPIN ◽  
2016 ◽  
Vol 06 (03) ◽  
pp. 1650009 ◽  
Author(s):  
Minghong Tang ◽  
Shaohai Chen ◽  
Xiangli Zhang ◽  
Zongzhi Zhang ◽  
Q. Y. Jin

We performed a detailed study on the perpendicular magnetic anisotropy (PMA) of TbCo film by using two kinds of nonmagnetic underlayers, Ta and Ta/Cu with different thicknesses. We found that for both the Tb-rich and Co-rich TbCo alloy films, the PMA strength decreases considerably with the increase of Ta underlayer thickness, while their net saturation magnetization [Formula: see text] exhibit opposite varying trends. The [Formula: see text] value continues to increase for the Co-rich TbCo samples while decrease for the Tb-rich films. Interestingly, an additional Cu layer inserted between the Ta and TbCo layers can efficiently recover the PMA and [Formula: see text]. We attribute such observed variation behaviors of magnetic properties to the increased disordering of Tb magnetic moments at the Ta/TbCo interface, which has been verified by both experimental measurements and micromagnetic simulations.


2001 ◽  
Vol 674 ◽  
Author(s):  
Masataka Masuda ◽  
Shun Matsumoto ◽  
Kunihiko Taka ◽  
Naoki Yoshitake ◽  
Yasunori Hayashi

ABSTRACTThe Co/Pd and Co/Pd artificial lattice films have attracted much interest by their special magnetization properties. We discussed the effect of the Pt, Pd layer thickness on the magnetic anisotropy, and we showed the effect of the hydrogen ion implantation on the magnetic properties of multi-layered films. The Co/Pt and Co/Pd multi-layered films were formed on Si(111) substrates with molecular beam epitaxy. We did structure analysis, magnetic domain analysis and magnetic properties evaluation with XRD, MFM and VSM, respectively. Among the series of films of 0.4nm Co layer, XRD showed that the film of 1.0nm Pt layer had a highest periodicity and that they had (111) plane orientation completely. The magnetic domain size reduced with the increase of the thickness of Pt layer. We found out that the coercivity decreased linearly as a function of the length of magnetic domain wall in the unit area. The result of VSM showed that the multi-layered films of Pt thickness of less than 2.8nm had perpendicular magnetic anisotropy. The perpendicular anisotropy energy changed by the nonmagnetic layer thickness and had a maximum value for 0.4nm Co 0.4nm/ nonmagnetic metal 1.0nm multi-layered film. After hydrogen implantation into the films, XRD showed that the lattice spacing was swelled with hydrogen dose. Also, MFM observed that the magnetic domain size reduced with the increase of the hydrogen dose. The easy axis of magnetization changed from perpendicular to parallel in the plane with the increase of the hydrogen dose. After evacuation of hydrogen at 473K, perpendicular anisotropy was partially recovered. This phenomenon suggested that the origin of magnetic anisotropy was mainly the lattice mismatch and distortion in the layer interface. But Co/Pd film was not recovered by this thermal treatment. This means that Pd made stable hydride and did not evacuate hydrogen at this temperature.


1989 ◽  
Vol 151 ◽  
Author(s):  
Frits J. A. den Broeder ◽  
Dick Kuiper ◽  
Willem Hoving

ABSTRACTCo/Pd multilayers containing one to eight atomic layers of cobalt and ten atomic layers of palladium per modulation period were prepared in two orienotarteiottnoss, [111]fcc and [001]fcc. The [111] films were polycrystalline, the [001] films were epitaxial.In this paper we compare the magnetic anisotropy of both types of films, which can be described by an interface anisotropy contribution favouring perpendicular magnetization and a volume contribution favouring in-plane magnetization. Depending on the deposition temperature, a perpendicular anisotropy for [111] films is found for up to about six atomic layers of Co. The [001] films however, show perpendicular anisotropy only for Co monolayers or Co bilayers. The large difference between the anisotropies in the two orientations is mainly caused by a strong in-plane anisotropy volume term which exists for [001] films, and which is attributed to the structural deformation of the Co layers from cubic to tetragonal. For both orientations a higher deposition temperature is found to lead to an increase of the interface anisotropy due to smoothing of the layers.


2017 ◽  
Vol 441 ◽  
pp. 585-589 ◽  
Author(s):  
R. Sbiaa ◽  
I.A. Al-Omari ◽  
M. Al Bahri ◽  
P.R. Kharel ◽  
M. Ranjbar ◽  
...  

2014 ◽  
Vol 616 ◽  
pp. 247-251
Author(s):  
Tim Yang ◽  
Z.Q. Wang ◽  
Makoto Kohda ◽  
Takeshi Seki ◽  
Koki Takanashi ◽  
...  

We investigate the perpendicular magnetic anisotropy dependence on the AlO capping layer in Pt/Co/AlO films. AlO was deposited on Pt/Co films by RF magnetron sputtering and atomic layer deposition (ALD) with varying thickness. It is found that the prolonged deposition of thick AlO layers by RF magnetron sputtering causes significant damage to the Pt/Co underneath while AlO layers formed by ALD can be of arbitrary thickness with no damage to the magnetic properties of the films. The decline of the magnetic properties can be attributed to the method of AlO deposition for each process. In the RF magnetron sputtering, AlO atoms with high kinetic energy are ejected from a sputter target resulting in the degradation of Pt/Co films, while the process of deposition of AlO by ALD is governed by a series of chemically reactive condensations allowing for arbitrary deposition thickness of AlO.


AIP Advances ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 115001
Author(s):  
Xiuting Liu ◽  
Qinghui Yang ◽  
Ding Zhang ◽  
Yujuan Wu ◽  
Huaiwu Zhang

2013 ◽  
Vol 596 ◽  
pp. 8-14 ◽  
Author(s):  
Kosuke Suzuki ◽  
Masaki Hayata ◽  
Katsuhiko Minegishi ◽  
Ryosuke Kondoh ◽  
Tadashi Kato ◽  
...  

Magnetic Compton profiles (MCPs) of Co/Au multilayers have been measured and analyzed by DV-Xαcluster model calculations from a viewpoint of perpendicular magnetic anisotropy (PMA). The PMA and the MCPs are discussed for the presently obtained results for Co/Au, along with the previously obtained results for Co/Pd and Co/Pt. A Co/Au multilayer shows a weak PMA which is caused by |m|=1 states of Co 3d electrons at a smooth Co/Au interface. The increase of the interface-to-volume ratio plays the main role in determining the perpendicular anisotropy in Co/Au multilayers. The strain of a Co layer can have a secondary role in determining the magnetic anisotropy in Co/Au multilayers, although the strain dominates PMA in the case of Co/Pd and Co/Pt multilayers.


2020 ◽  
Vol 101 (10) ◽  
Author(s):  
Keita Ito ◽  
Yoko Yasutomi ◽  
Siyuan Zhu ◽  
Munisa Nurmamat ◽  
Masaki Tahara ◽  
...  

2017 ◽  
Vol 121 (4) ◽  
pp. 043905 ◽  
Author(s):  
Enlong Liu ◽  
J. Swerts ◽  
T. Devolder ◽  
S. Couet ◽  
S. Mertens ◽  
...  

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