Optical Indices of Pyrolytic Tin-Oxide Glass

1996 ◽  
Vol 426 ◽  
Author(s):  
K. Von Rottkay ◽  
M. Rubin

AbstractSnO2:F is a widely used transparent conductor and commercially available in a multilayer structure as Tech glass. Current applications include photovoltaics, electrochromics and displays. Optical design of these and other applications requires knowledge of the optical constants, in some cases, over the whole solar spectrum. Various optical property measurements were performed including variable angle spectroscopic ellipsometry, and spectral transmittance and reflectance measurements. This material is deposited in several steps and has a fairly complex structure. The measured data were fit to models based on this structure to obtain the optical indices. Atomic force microscopy confirmed the optically modeled surface roughness.

Materials ◽  
2021 ◽  
Vol 14 (23) ◽  
pp. 7292
Author(s):  
Tomasz Rerek ◽  
Beata Derkowska-Zielinska ◽  
Marek Trzcinski ◽  
Robert Szczesny ◽  
Mieczyslaw K. Naparty ◽  
...  

Copper layers with thicknesses of 12, 25, and 35 nm were thermally evaporated on silicon substrates (Si(100)) with two different deposition rates 0.5 and 5.0 Å/s. The microstructure of produced coatings was studied using atomic force microscopy (AFM) and powder X-ray diffractometer (XRD). Ellipsometric measurements were used to determine the effective dielectric functions <ε˜> as well as the quality indicators of the localized surface plasmon (LSP) and the surface plasmon polariton (SPP). The composition and purity of the produced films were analysed using X-ray photoelectron spectroscopy (XPS).


Langmuir ◽  
2003 ◽  
Vol 19 (17) ◽  
pp. 6570-6572 ◽  
Author(s):  
Nathalie Destouches ◽  
Marie Foret ◽  
Eric Courtens ◽  
Michel Ramonda

2018 ◽  
Vol 9 ◽  
pp. 407-414 ◽  
Author(s):  
Olga V Sinitsyna ◽  
Georgy B Meshkov ◽  
Anastasija V Grigorieva ◽  
Alexander A Antonov ◽  
Inna G Grigorieva ◽  
...  

Graphite oxide has a complex structure that can be modified in many ways to obtain materials for a wide range of applications. It is known that the graphite precursor has an important role in the synthesis of graphite oxide. In the present study, the basal-plane surface of highly annealed pyrolythic graphite (HAPG) was oxidized by Hummers’ method and investigated by Raman spectroscopy and atomic force microscopy. HAPG was used as a graphite precursor because its surface after cleavage contains well-ordered millimeter-sized regions. The treatment resulted in graphite intercalation by sulfuric acid and blister formation all over the surface. Surprisingly, the destruction of the sp2-lattice was not detected in the ordered regions. We suggest that the reagent diffusion under the basal plane surface occurred through the cleavage steps and dislocations with the Burgers vector parallel to the c-axis in graphite.


2014 ◽  
Vol 875-877 ◽  
pp. 223-227
Author(s):  
Mei Dong Huang ◽  
Shan Du ◽  
Hong Yu Li ◽  
Chun Wei Liu ◽  
Xiao Hong Tang

Influence of argon flow on the optical properties of titanium oxide films, which were fabricated on well-polished K9 glass substrate through r.f. magnetron sputtering, has been investigated. X-ray diffraction (XRD) was employed to analyse the microstructure. Surface morphology was observed by atomic force microscopy (AFM). Transmittance of the films was measured within the visible range by UV-3600 spectrometer. The optical constants, such as thickness, refractive index and extinction coefficient, were measured using an ellipsometer. The experimental results and the effects of argon flow on optical constants of the TiO2films have been discussed and analysed.


2008 ◽  
Vol 15 (06) ◽  
pp. 787-791
Author(s):  
PEI ZHAO ◽  
RENG WANG ◽  
DINGQUAN LIU ◽  
FENGSHAN ZHANG ◽  
WEITAO SU ◽  
...  

The effects of the roughness of ZnS underlayer on the microstructure, optical, and electrical properties of nanometer Ag thin film have been investigated in this paper. Nanometer Ag thin films in glass/ ZnS /7.5 nm Ag /30 nm ZnS stacks have been deposited and analyzed. In the stacks, the underlayers of ZnS have been sputtered with various thicknesses to generate various surface roughnesses. The X-ray diffraction (XRD) has been used to study the crystal structure of Ag films. The surface topography and the roughness of ZnS underlayer have been analyzed by atomic force microscopy. The sheet resistant will become larger as the increasing of the roughness. The optical constants can be derived by fitting the transmission and reflectance spectrum. From optical constants comparison of Ag films, with the surface of the stack becoming rougher, it was found that the refractive index will increase but the extinction coefficient will decrease.


2010 ◽  
Vol 29 (1) ◽  
pp. 97 ◽  
Author(s):  
Anuar Kassim ◽  
Tan Wee Tee ◽  
Abdul Halim Abdullah ◽  
Saravanan Nagalingam ◽  
Ho Soon Min

A low cost chemical bath deposition method has been used for the preparation of Cu4SnS4 thin films onto indium tin oxide glass substrate. The deposition parameters such as bath temperature (50 °C), deposition time (120 min), electrolyte concentration (0.05 M) and bath pH (1.5) were optimized to obtain good quality thin films. The structural, surface morphological and optical properties of thin films were studied by X-ray diffraction, an atomic force microscopy and an UV-Vis Spectrophotometer, respectively. The X-ray diffraction study revealed that the Cu4SnS4 films were polycrystalline in nature with the preferential orientation along the (221) plane. The atomic force microscopy results indicated that the films were smooth, uniform and the substrate surface was covered completely at these experimental conditions. These films exhibited p-type semiconductor behavior with the band gap energy about 1.57 eV.


1995 ◽  
Vol 382 ◽  
Author(s):  
F. Czerwinski ◽  
J.A. Szpunar ◽  
W.W. Smeltzer

ABSTRACTOxide films up to 200 nm thick were grown at high temperatures on Ni substrates implantedwith 2x1016 Ce ions/cm2. The surface morphology, microstructure and microchemistry were examined by AFM and TEM/STEM techniques. It has been found that the oxide films are composed of three well defined sublayers, with essentially different microstructure and Ce concentration. The outer layer is composed of NiO and CeO2 nanocrystals with a size less than 5 nm. The same two phases are also present within the middle layer, although the NiO grains are much larger in comparison to nano-sized CeO2. In addition, Ce segregation along the NiO grain boundaries is detected in this layer. The inner layer is the thickest one and is composed of pure NiO grains. Oxide films having such a complex structure are characterized by a very low diffusion rate for both metal and oxygen ions. Oxygen isotope experiments revealed that the diffusion processes within the oxide film are controlled by the Ce-rich layers.


2020 ◽  
Vol 11 ◽  
pp. 1750-1756
Author(s):  
Tatsuya Yamamoto ◽  
Ryo Izumi ◽  
Kazushi Miki ◽  
Takahiro Yamasaki ◽  
Yasuhiro Sugawara ◽  
...  

The atomic arrangement of the Si(110)-(16×2) reconstruction was directly observed using noncontact atomic force microscopy (NC-AFM) at 78 K. The pentagonal structure, which is the most important building block of the reconstruction, was concluded to consist of five atoms, while only four or five spots (depending on tip bias) have been reported with scanning tunneling microscopy (STM). Single atoms were determined to exist near step edges between upper and lower terraces, which have not been reported using STM. These findings are key evidence for establishing an atomic model of the Si(110)-(16×2) reconstruction, which indeed has a complex structure.


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