Investigation of Vacancies in GaN by Positron Annihilation

1996 ◽  
Vol 449 ◽  
Author(s):  
L. V. JØrgensen ◽  
A. C. Kruseman ◽  
H. Schut ◽  
A. Van Veen ◽  
M. Fanciulli ◽  
...  
Keyword(s):  
Positron Beam ◽  
High Resistivity ◽  
S Parameter ◽  
Yield Information ◽  
Beam Analysis ◽  
Core Electrons ◽  
P Type ◽  
Coincidence Measurements ◽  
Higher Sensitivity ◽  
Mg Doped

ABSTRACTPositron beam analysis has been performed on autodoped n-type, semi-insulating and Mg doped p-type epitaxially grown layers of GaN on sapphire. Doppler Broadening measurements clearly indicate the presence of vacancies in the intrinsically autodoped n-type GaN by an increase in the annihilation Doppler lineshape S-parameter of 1.04 relative to the value for the high resistivity sample. This value is typical for vacancy-type defects in compound semiconductors such as GaAs. Results of experiments with higher sensitivity to core-electrons are also presented. These two detector coincidence measurements yield information on the chemical environment surrounding the vacancies. The results are consistent with the presence of Ga vacancies in the autodoped n-type sample.

Positron Beam Analysis of Amorphous Silicon

1992 ◽  
Vol 105-110 ◽  
pp. 1391-1394 ◽  
Author(s):  
R.A. Hakvoort ◽  
S. Roorda ◽  
A. van Veen ◽  
M.J. van den Boogaard ◽  
F.J.M. Buters ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Positron Beam ◽  
Beam Analysis

scholarly journals Vacancy-type defects in Mg-doped GaN grown by ammonia-based molecular beam epitaxy probed using a monoenergetic positron beam

2016 ◽  
Vol 119 (24) ◽  
pp. 245702 ◽  
Author(s):  
Akira Uedono ◽  
Marco Malinverni ◽  
Denis Martin ◽  
Hironori Okumura ◽  
Shoji Ishibashi ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Positron Beam ◽  
Mg Doped

Electronic transport in p-type Mg-doped GaAs nanowires

2016 ◽  
Vol 253 (10) ◽  
pp. 1960-1964 ◽  
Author(s):  
N. Cifuentes ◽  
H. Limborço ◽  
E. R. Viana ◽  
D. B. Roa ◽  
A. Abelenda ◽  
...  
Keyword(s):  
Electronic Transport ◽  
Gaas Nanowires ◽  
P Type ◽  
Mg Doped

Ion-implantation Generated Nanovoids in Si and MgO Monitored by High Resolution Positron Beam Analysis

2000 ◽  
Vol 647 ◽  
Author(s):  
S.W.H. Eijt ◽  
C.V. Falub ◽  
A. van Veen ◽  
H. Schut ◽  
P.E. Mijnarends ◽  
...  
Keyword(s):  
High Resolution ◽  
Ion Implantation ◽  
Average Energy ◽  
Internal Surface ◽  
Positron Beam ◽  
Initial Energy ◽  
Thin Layers ◽  
Beam Analysis ◽  
Width Reduction ◽  
Non Destructive

AbstractThe formation of nanovoids in Si(100) and MgO(100) by 3He ion implantation has been studied. Contrary to Si in which the voids are generally almost spherical, in MgO nearly perfectly rectangular nanosize voids are created. Recently, the 2D-ACAR setup at the Delft Positron Research Center has been coupled to the intense reactor-based variable-energy positron beam POSH. This allows a new method of monitoring thin layers containing nanovoids or defects by depth-selective high-resolution positron beam analysis. The 2D-ACAR spectra of Si with a buried layer of nanocavities reveal the presence of two additional components, the first related to para-positronium (p-Ps) formation in the nanovoids, and a second one most likely related to unsaturated Si-bonds at the internal surface of the voids. The positronium is present in excited kinetic states with an average energy of 0.3 eV. Refilling of the cavities by means of low dose 3He implantation (1×1014 cm−2) followed by annealing reduces the formation of Ps and the width of the Ps peak in the ACAR spectrum. This width reduction is due to collisions of Ps with He atoms in the voids. In MgO, p-Ps formed with an initial energy of ~3 eV shows a final average energy of 1.6 eV at annihilation due to collisions with the cavity walls. Possibilities of this new, non-destructive method of monitoring the sizes of cavities and the evolution of nanovoid layers will be discussed.

Positron Beam Analysis of Polymer/Metal Interfaces under Stress

2001 ◽  
Vol 363-365 ◽  
pp. 499-501 ◽  
Author(s):  
R. Escobar Galindo ◽  
A. van Veen ◽  
A. Alba García ◽  
H. Schut ◽  
Jeff T.M. de Hosson
Keyword(s):  
Positron Beam ◽  
Beam Analysis ◽  
Polymer Metal ◽  
Metal Interfaces

Structural, electrical and optical properties of Mg-doped CuAlO2 films by pulsed laser deposition

RSC Advances ◽  
2014 ◽  
Vol 4 (78) ◽  
pp. 41294-41300 ◽  
Author(s):  
Y. S. Zou ◽  
H. P. Wang ◽  
S. L. Zhang ◽  
D. Lou ◽  
Y. H. Dong ◽  
...  
Keyword(s):  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Band Gaps ◽  
Laser Deposition ◽  
Electrical And Optical Properties ◽  
Optical Band Gaps ◽  
P Type ◽  
Enhanced Conductivity ◽  
Mg Doped

P-type Mg doped CuAlO2 films with high crystallinity are prepared by pulsed laser deposition followed by annealing, and exhibit enhanced conductivity and tunable optical band gaps.

Increased p-type conductivity through use of an indium surfactant in the growth of Mg-doped GaN

2015 ◽  
Vol 106 (22) ◽  
pp. 222103 ◽  
Author(s):  
Erin C. H. Kyle ◽  
Stephen W. Kaun ◽  
Erin C. Young ◽  
James S. Speck
Keyword(s):  
Type Conductivity ◽  
P Type ◽  
Mg Doped

Ohmic and Rectifying Contacts on High Resistivity P-Type Cadmium Telluride

1982 ◽  
Vol 16 ◽  
Author(s):  
A. Musa ◽  
J.P. Ponpon ◽  
M. Hage-Ali
Keyword(s):  
Cadmium Telluride ◽  
Current Flow ◽  
Electrical Characterization ◽  
High Resistivity ◽  
Experimental Conditions ◽  
Low Leakage ◽  
Low Leakage Current ◽  
Gold Contact ◽  
P Type ◽  
A Current

ABSTRACTOhmic and rectifying contacts on high resistivity etched P-type cadmium telluride have been studied in order to produce diode structures.For this,we have first investigated the properties of gold contacts obtained by chemical reactions of CdTe dippedin gold chloride.Both electrical characterization and structure have been analyzed as a function of the experimental conditions of the contact deposition.The results can be interpreted in terms of a current flow enhanced by tunnelling through the Au-CdTe junction and related to the structure of the interface a few tens of nanometer below the gold contact. In addition,several rectifying contacts have been investigated , in order to achieve a structure having low leakage current.

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