Etching of Polymers by Photo-Material Processing using an Excimer Lamp
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ABSTRACTAn excimer lamp is a new light source which can produce shorter wavelength of vacuum ultraviolet radiation than conventional ArF excimer lasers. We have tried to use the excimer lamp for photo-etching of polymers such as polymethylmetacrylie and polyimidic resins. We have found that the etching process was including the chemical and the quantumn processes. We also applied this technique for etching of some single crystalline organic materials which were very important to opt-electronic applications.
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1983 ◽
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