Etching of Polymers by Photo-Material Processing using an Excimer Lamp

1996 ◽  
Vol 451 ◽  
Author(s):  
Noritaka Takezoe ◽  
Atsushi Yokotani ◽  
Kou Kurosawa ◽  
Wataru Sasaki ◽  
Kunio Yoshida ◽  
...  

ABSTRACTAn excimer lamp is a new light source which can produce shorter wavelength of vacuum ultraviolet radiation than conventional ArF excimer lasers. We have tried to use the excimer lamp for photo-etching of polymers such as polymethylmetacrylie and polyimidic resins. We have found that the etching process was including the chemical and the quantumn processes. We also applied this technique for etching of some single crystalline organic materials which were very important to opt-electronic applications.

2010 ◽  
Vol 1 (MEDSI-6) ◽  
Author(s):  
U. Ellenberger ◽  
H. Kalt ◽  
P. Böhler ◽  
A. Schwarb ◽  
S. Sonderegger ◽  
...  

The beamline optics of the vacuum-ultraviolet radiation beamline installed on a bending magnet of the Swiss Light Source are to be upgraded. Supports for all three optical elements of the beamline optics (collimating mirror, plane grating monochromator and focusing mirror) have been re-designed to allow a more stable and improved fine tuning. The monochromator is composed of a set of three interchangeable gratings mounted on a rotatable platform. Each grating is framed in an optimized goniometer mount, designed and built in-house, which uses flexible elements for precise and reproducible adjustments. The roll and yaw of the gratings can be adjusted with microradian precision to minimize conical diffraction.


2017 ◽  
Vol 135 (11) ◽  
pp. 45973 ◽  
Author(s):  
Tetsuro Yoshioka ◽  
Yoshiki Miyashita ◽  
Taichi Motoo ◽  
Kentaro Saito ◽  
Kazukiyo Nagai

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