Electron cyclotron resonance light source assembly—A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasma

Review of Scientific Instruments ◽

10.1063/1.1150427 ◽

2000 ◽

Vol 71 (2) ◽

pp. 1200-1202 ◽

Author(s):

P. Grübling ◽

J. Hollandt ◽

G. Ulm

Keyword(s):

Ultraviolet Radiation ◽

Light Source ◽

Cyclotron Resonance ◽

Radiation Source ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Vacuum Ultraviolet Radiation ◽

Resonance Plasma

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Vacuum ultraviolet radiation damage in electron cyclotron resonance and reactive ion etch plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577365 ◽

1991 ◽

Vol 9 (3) ◽

pp. 804-809 ◽

Author(s):

D. A. Buchanan ◽

G. Fortuño‐Wiltshire

Keyword(s):

Ultraviolet Radiation ◽

Radiation Damage ◽

Cyclotron Resonance ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Vacuum Ultraviolet Radiation

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Study of gasdynamic electron cyclotron resonance plasma vacuum ultraviolet emission to optimize negative hydrogen ion production efficiency

Review of Scientific Instruments ◽

10.1063/1.5128313 ◽

2020 ◽

Vol 91 (1) ◽

pp. 013517 ◽

Author(s):

R. L. Lapin ◽

V. A. Skalyga ◽

I. Izotov ◽

S. V. Razin ◽

R. A. Shaposhnikov ◽

...

Keyword(s):

Cyclotron Resonance ◽

Production Efficiency ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Hydrogen Ion ◽

Ultraviolet Emission ◽

Electron Cyclotron Resonance Plasma ◽

Ion Production ◽

Resonance Plasma

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Topography of an electron cyclotron resonance plasma in the vacuum-ultraviolet spectral range

Review of Scientific Instruments ◽

10.1063/1.1431699 ◽

2002 ◽

Vol 73 (2) ◽

pp. 614-616 ◽

Author(s):

P. Grübling ◽

J. Hollandt ◽

G. Ulm

Keyword(s):

Spectral Range ◽

Cyclotron Resonance ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

Applied Physics Letters ◽

10.1063/1.102487 ◽

1990 ◽

Vol 56 (15) ◽

pp. 1424-1426 ◽

Author(s):

S. J. Pearton ◽

U. K. Chakrabarti ◽

A. P. Kinsella ◽

D. Johnson ◽

C. Constantine

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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X-ray photoelectron diffraction observation of β-SiC(001) obtained by electron cyclotron resonance plasma assisted growth on Si(001)

Applied Surface Science ◽

10.1016/0169-4332(93)90239-8 ◽

1993 ◽

Vol 68 (4) ◽

pp. 575-582 ◽

Author(s):

M. Diani ◽

J.L. Bischoff ◽

L. Kubler ◽

D. Bolmont

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Photoelectron Diffraction ◽

Resonance Plasma

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Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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Deposition of high‐quality TiN using tetra‐isopropoxide titanium in an electron cyclotron resonance plasma process

Applied Physics Letters ◽

10.1063/1.114847 ◽

1995 ◽

Vol 67 (20) ◽

pp. 2934-2935 ◽

Author(s):

A. Weber ◽

R. Poeckelmann ◽

C.‐P. Klages

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low-damage electron-beam-assisted dry etching of GaAs and AlGaAs using electron cyclotron resonance plasma electron source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586892 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2288 ◽

Author(s):

Heiji Watanabe

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Dry Etching ◽

Plasma Electron ◽

Electron Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Electron Source ◽

Resonance Plasma

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c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Film Substrate ◽

Resonance Plasma

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