Structure, Optical and Electrical Properties of Pulsed Laser Deposited and Ion Beam Deposited CNx Films

1997 ◽  
Vol 498 ◽  
Author(s):  
K. F. Chan ◽  
X.-A. Zhao ◽  
C. W. Ong
Keyword(s):  
Electrical Conductivity ◽  
Electrical Properties ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Film Structure ◽  
Laser Deposition ◽  
Optical And Electrical Properties ◽  
Ion Beam Deposition ◽  
Valence Bands ◽  
Beam Deposition

ABSTRACTCNx films were deposited using pulsed laser deposition (PLD) and ion beam deposition (IBD). The PLD films deposited at substrate temperature Ts = 25°C and high N2 partial pressure have the highest N content (fN) and polymerlike structure, accompanied by large band gap (Eg) and low electrical conductivity (σroom). The rise in Ts lowers fN and induces graphitization of the film structure, so Eg reduces and σroom increases. IBD (with and without N2+ assist) films are graphitic. Higher Ts further enhances the graphitization of the film structure, such that the conduction and valence bands overlap, and σroom approaches to that of graphite. No evidence was found to show successful formation of the hypothetical β-C3N4 phase in the films.

Novel Materials Synthesis Using an Intense Pulsed Ion Beam

1992 ◽  
Vol 279 ◽  
Author(s):  
D. C. Gautier ◽  
R. E. Muenchausen ◽  
D. J. Rej ◽  
B. F. Roberts ◽  
G. Johnston ◽  
...  
Keyword(s):  
Ion Beam ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Single Shot ◽  
Materials Synthesis ◽  
Large Area ◽  
Beam Source ◽  
Ion Beam Deposition ◽  
Ceramic Targets ◽  
Beam Deposition

ABSTRACTInitial experiments on the evaporation from metallic and ceramic targets using a pulsed light ion beam source is reported. The source is an intense ion beam produced by a 1.2 MV, 300 kJ Anaconda generator which has been fitted with an extraction diode.Beam fluences of 10–20 J/cm2 give a deposition rate of about 30–50 nm per shot, for both brass and YBa2Cu3O7-x (1–2–3) targets. This is about 1000 times greater than comparable rates from pulsed laser deposition (PLD). Single-shot ablated 1–2–3 films, deposited on Si, were analyzed using RBS; the measured stoichiometry was close to 1–2–3 in favorable cases, but shot-to-shot reproducibili ty was poor.Approximately 1% of the available ion beam energy was utilized for these initial experiments. The potential for producing large area coatings from multi-cation targets and nanophase powders using pulsed ion beam deposition will be discussed.

Thickness Influence on Optical and Electrical Properties of PbI2 Films Prepared by Pulsed Laser Deposition

2018 ◽  
Vol 10 (5) ◽  
pp. 701-706 ◽  
Author(s):  
Haibo Fan ◽  
Xianpei Ren ◽  
Zhou Yang ◽  
Xiaodong Ren ◽  
Fengwei Xiao ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Optical And Electrical Properties
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