Monte Carlo Atomistic Simulation of Polycrystalline Aluminum Deposition

ABSTRACTA new atomistic scheme for simulating polycrystalline thin film deposition based on a Monte Carlo approach has been developed. Simulations of polycrystalline aluminum deposition and annealing at different temperatures are presented. The time evolution of the film morphology for those temperatures is discussed. During deposition, columnar growth is observed at low temperatures. Grain growth takes place mainly during annealing. Faceting and selection of preferred crystal orientations (texture) is observed.