Atomic Layer CVD for Continuously Shrinking Devices

2000 ◽  
Vol 612 ◽  
Author(s):  
Suvi Haukka ◽  
Kai-Erik Elers ◽  
Marko Tuominen

AbstractThis paper will review the basics of the atomic layer chemical vapor deposition (ALCVD) thin film growth technique. The emphasis is on the ALCVD metal nitride growth and dual damascene barrier requirements.

2012 ◽  
Vol 89 ◽  
pp. 109-115 ◽  
Author(s):  
Jong Mun Choi ◽  
Dohan Lee ◽  
Ji Hun Park ◽  
Chang Gyoun Kim ◽  
Taek-Mo Chung ◽  
...  

1990 ◽  
Vol 8 (3) ◽  
pp. 1864-1870 ◽  
Author(s):  
John E. Crowell ◽  
Laura L. Tedder ◽  
Hee‐Chuen Cho ◽  
Frank M. Cascarano ◽  
Mark A. Logan

1993 ◽  
Vol 97 (45) ◽  
pp. 11781-11786 ◽  
Author(s):  
Chao Ming Chiang ◽  
Timothy M. Miller ◽  
Lawrence H. Dubois

2012 ◽  
Vol 83 (9) ◽  
pp. 094701 ◽  
Author(s):  
Eiji Fujimoto ◽  
Masatomo Sumiya ◽  
Tsuyoshi Ohnishi ◽  
Mikk Lippmaa ◽  
Masaki Takeguchi ◽  
...  

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