Atomic Layer CVD for Continuously Shrinking Devices
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AbstractThis paper will review the basics of the atomic layer chemical vapor deposition (ALCVD) thin film growth technique. The emphasis is on the ALCVD metal nitride growth and dual damascene barrier requirements.
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2012 ◽
Vol 89
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pp. 109-115
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1993 ◽
Vol 32
(Part 1, No. 9B)
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pp. 4074-4077
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1992 ◽
Vol 10
(4)
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pp. 719-727
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1990 ◽
Vol 8
(3)
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pp. 1864-1870
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1993 ◽
Vol 97
(45)
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pp. 11781-11786
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2012 ◽
Vol 83
(9)
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pp. 094701
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