Characterization of Zinc Oxide Thin Films Deposited by rf Magnetron Sputtering on Mylar Substrates

ABSTRACTAluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 µm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×10−2 ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices.

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Zinc Oxide Thin Films Deposited by RF Magnetron Sputtering on Mylar Substrates at Room Temperature

MRS Proceedings ◽

10.1557/proc-685-d5.10.1 ◽

2001 ◽

Vol 685 ◽

Author(s):

Elvira Fortunato ◽

Patrícia Nunes ◽

António Marques ◽

Daniel Costa ◽

Hugo Águas ◽

...

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Room Temperature ◽

Low Cost ◽

Substrate Surface ◽

Hexagonal Wurtzite Structure ◽

Oxide Thin Films ◽

Large Area ◽

Axis Orientation

AbstractAluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 μm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×10−2 ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices.

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Zinc Oxide Thin Films Grown on Nanostructured Al Thin Layer/Glass Substrate by RF Magnetron Sputtering

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.239-242.777 ◽

2011 ◽

Vol 239-242 ◽

pp. 777-780

Author(s):

Ting Zhi Liu ◽

Shu Wang Duo ◽

C Y Hu ◽

C B Li

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Thin Layer ◽

Glass Substrate ◽

Rf Magnetron Sputtering ◽

Zno Films ◽

Zno Film ◽

Substrate Roughness ◽

Axis Orientation

ZnO films were deposited on nanostructured Al (n-Al) /glass substrate by RF magnetron sputtering. The results shows that the relation (I (002) /I (100) ≈ I annealed (002)/I annealed (100) ≈1.1) shows the rough n-Al surface is suitable for the growth of a-axis orientation. Meanwhile, the influences of substrate roughness, crystallinity and (101) plane of ZnO film deposited on n-Al layer have been discussed. XPS implies more oxygen atoms are bound to Aluminum atoms, which result in the increase of high metallic Zn in the film.

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