scholarly journals Luminescent Characteristics of InGaAsP/InP Multiple Quantum Well Structures by Impurity-Free Vacancy Disordering

2001 ◽  
Vol 692 ◽  
Author(s):  
J. Zhao ◽  
X. D. Zhang ◽  
Z. C. Feng ◽  
J. C. Deng ◽  
P. Jin ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Band Gap ◽  
Annealing Temperature ◽  
Multiple Quantum Well ◽  
Blue Shift ◽  
Multiple Quantum ◽  
Quantum Well Structures ◽  
Cladding Layer ◽  
Cap Layer ◽  
Free Vacancy

AbstractInGaAsP/InP multiple quantum wells have been prepared by Impurity-Free Vacancy Disordering (IFVD). The luminescent characteristics was investigated using photoluminescence (PL) and photoreflectance (PR), from which the band gap blue shift was observed. Si3N4, SiO2 and SOG were used for the dielectric layer to create the vacancies. All samples were annealed by rapid thermal anne aling (RTA). The results indicate that the band gap blue shift varies with the dielectric layers and annealing temperature. The SiO2 capping was successfully used with an InGaAs cladding layer to cause larger band tuning effect in the InGaAs/InP MQWs than the Si3N4 capping with an InGaAs cladding layer. On the other hand, samples with the Si3N4-InP cap layer combination also show larger energy shifts than that with SiO2-InP cap layer combination.

scholarly journals Luminescent Characteristics of InGaAsP/InP Multiple Quantum Well Structures by Impurity-Free Vacancy Disordering

2001 ◽  
Vol 693 ◽  
Author(s):  
J. Zhao ◽  
X. D. Zhang ◽  
Z. C. Feng ◽  
J. C. Deng ◽  
P. Jin ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Band Gap ◽  
Annealing Temperature ◽  
Multiple Quantum Well ◽  
Blue Shift ◽  
Multiple Quantum ◽  
Quantum Well Structures ◽  
Cladding Layer ◽  
Cap Layer ◽  
Free Vacancy

AbstractInGaAsP/InP multiple quantum wells have been prepared by Impurity-Free Vacancy Disordering (IFVD). The luminescent characteristics was investigated using photoluminescence (PL) and photoreflectance (PR), from which the band gap blue shift was observed. Si3N4, SiO2 and SOG were used for the dielectric layer to create the vacancies. All samples were annealed by rapid thermal anne aling (RTA). The results indicate that the band gap blue shift varies with the dielectric layers and annealing temperature. The SiO2 capping was successfully used with an InGaAs cladding layer to cause larger band tuning effect in the InGaAs/InP MQWs than the Si3N4 capping with an InGaAs cladding layer. On the other hand, samples with the Si3N4-InP cap layer combination also show larger energy shifts than that with SiO2-InP cap layer combination.

Characterization and Griwth of Oicanic Multiple Qanm Well Structures

1990 ◽  
Vol 198 ◽  
Author(s):  
F.F. So ◽  
S.R. Forrest ◽  
Y.Q. Shi ◽  
W.H. Steier
Keyword(s):  
Quantum Well ◽  
Layer Thickness ◽  
Organic Semiconductors ◽  
Multiple Quantum Well ◽  
Energy Shift ◽  
Blue Shift ◽  
Multiple Quantum ◽  
Quantum Well Structures ◽  
Singlet Exciton ◽  
Molecular Beam Deposition

ABSTRACTMultiple quantum well structures consisting of alternating layers of two crystalline organic semiconductors, namely, 3,4,9,10 perylenetetracarboxylic dianhydride (PTCDA) and 3,4,7,8 naphthalenetetracarboxylic dianhydride (NTCDA), have been grown by organic molecular beam deposition. The layer thickness was varied from 10 to 200 Å. Birefringence measurements indicate that there is a strong structural ordering in all PrCDA layers, although the PrCDA and NTCDA crystal structures are incommensurate. From optical absorption measurements, it is found there is a blue shift in the lowest energy PICDA singlet exciton line with decreasing layer thickness. A model based on exciton quantum confinement is proposed to explain the energy shift. We have measured the low temperature photoluminescence spectra of organic quantum well structures, and found a slight red shift in the spectra with decreasing well width. These results are also discussed.

scholarly journals Band gap blue shift of InGaAs/InP multiple quantum wells by different dielectric film coating and annealing

2006 ◽  
Vol 498 (1-2) ◽  
pp. 179-182 ◽  
Author(s):  
J. Zhao ◽  
J. Chen ◽  
Z.C. Feng ◽  
J.L. Chen ◽  
R. Liu ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Band Gap ◽  
Dielectric Film ◽  
Blue Shift ◽  
Film Coating ◽  
Multiple Quantum Wells ◽  
Multiple Quantum

Emission Mechanisms in UV Emitting GaN/AlN Multiple Quantum Well Structures

2003 ◽  
Vol 798 ◽  
Author(s):  
Madalina Furis ◽  
Alexander N. Cartwright ◽  
Hong Wu ◽  
William J. Schaff
Keyword(s):  
Quantum Well ◽  
Quantum Wells ◽  
Temperature Dependence ◽  
Multiple Quantum Well ◽  
Activation Energies ◽  
Inhomogeneous Broadening ◽  
Binding Energies ◽  
Multiple Quantum ◽  
Quantum Well Structures ◽  
Donor And Acceptor

ABSTRACTThe need for efficient UV emitting semiconductor sources has prompted the study of a number of heterostructures of III-N materials. In this work, the temperature dependence of the photoluminescence (PL) properties of UV-emitting GaN/AlN multiple quantum well (MQW) heterostructures were investigated in detail. In all samples studied, the structure consisted of 20 GaN quantum wells, with well widths varying between 7 and 15 Å, clad by 6nm AlN barriers, grown on top of a thick AlN buffer that was deposited on sapphire by molecular beam epitaxy. The observed energy corresponding to the peak of the emission spectrum is in agreement with a model that includes the strong confinement present in these structures and the existence of the large built-in piezoelectric field and spontaneous polarization present inside the wells. The observed emission varies from 3.5 eV (15 Å well) to 4.4 eV (7 Å well). Two activation energies associated with the photoluminescence quenching are extracted from the temperature dependence of the time-integrated PL intensity. These activation energies are consistent with donor and acceptor binding energies and the PL is dominated by recombination involving carriers localized on donor and/or acceptor states.Moreover, the temperature dependence of the full width at half-maximum (FWHM) of the PL feature indicates that inhomogeneous broadening dominates the spectrum at all temperatures. For the 15 and 13 Å wells, we estimate that the electron-phonon interaction is responsible for less than 30% of the broadening at room temperature. This broadening is negligible in the 9 Å wells over the entire temperature range studied. Well width fluctuations are primarily responsible for the inhomogeneous broadening, estimated to be of the order of 250meV for one monolayer fluctuation in well width.

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