Structural and Spectroscopic Study of Manganese Silicide Islands on Silicon
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AbstractThe Mn deposited clean Si (111) substrates were examined with UHV-TEM and STM that are part of an UHV-TEM/STM integrated characterization system. The Mn deposition with coverages of 5-20 ML followed by annealing at 673 K formed MnSi islands with Moire fringes. They showed metallic character. Subsequent annealing at 873 K dissipated the islands instead of transforming them into MnSi1.7. The re-deposition of Mn and re-annealing at 473 K succeeded to transform MnSi islands into MnSi1.7. The islands had several orientation relationships with substrate Si, and were semiconducting. The growth mechanism of MnSi1.7 is inferred.
1968 ◽
Vol 26
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pp. 426-427
2017 ◽
Vol 97
(25)
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pp. 2207-2224
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2010 ◽
Vol 663-665
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pp. 1273-1276
2005 ◽
Vol 123
(13)
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pp. 134501
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