Fabrication of Nanoimprint Stamps by Nanosphere Lithography

AbstractAnovel scheme for the fabrication of large-area nanoimprint stamps has been developed based on the utilization of a combination of nanosphere lithography and reactive ion etching. Both single and double layer polystyrene beads have been employed to construct well-ordered, periodic silicon nanopillar arrays. The nanopillar arrays fabricated by this method have been successfully used as the stamps for nanoimprint lithography. Our result indicates that this approach is capable of producing large-area sub-50 nm periodic nanostructures.

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Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching

Optics Express ◽

10.1364/oe.393328 ◽

2020 ◽

Vol 28 (10) ◽

pp. 15542 ◽

Cited By ~ 1

Author(s):

Christopher A. Dirdal ◽

Geir Uri Jensen ◽

Hallvard Angelskår ◽

Paul Conrad Vaagen Thrane ◽

Jo Gjessing ◽

...

Keyword(s):

High Throughput ◽

Nanoimprint Lithography ◽

Reactive Ion Etching ◽

Large Area ◽

Ion Etching ◽

Deep Reactive Ion Etching

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Nanoindentation of crystalline silicon pillars fabricated by soft UV nanoimprint lithography and cryogenic deep reactive ion etching

Sensors and Actuators A Physical ◽

10.1016/j.sna.2018.09.035 ◽

2018 ◽

Vol 283 ◽

pp. 65-78 ◽

Cited By ~ 11

Author(s):

Gerry Hamdana ◽

Prabowo Puranto ◽

Jannick Langfahl-Klabes ◽

Zhi Li ◽

Frank Pohlenz ◽

...

Keyword(s):

Nanoimprint Lithography ◽

Crystalline Silicon ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Silicon Pillars

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Plasmonic Properties of Anchored Nanoparticles Fabricated by Reactive Ion Etching and Nanosphere Lithography

The Journal of Physical Chemistry C ◽

10.1021/jp064094w ◽

2007 ◽

Vol 111 (11) ◽

pp. 4116-4124 ◽

Cited By ~ 66

Author(s):

Erin M. Hicks ◽

Olga Lyandres ◽

W. Paige Hall ◽

Shengli Zou ◽

Matthew R. Glucksberg ◽

...

Keyword(s):

Reactive Ion Etching ◽

Nanosphere Lithography ◽

Ion Etching

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Fabrication of silicon nanopillar arrays by electron beam lithography and reactive ion etching for advanced bacterial adhesion studies

Materials Research Express ◽

10.1088/2053-1591/ab0a16 ◽

2019 ◽

Vol 6 (6) ◽

pp. 065402 ◽

Cited By ~ 5

Author(s):

P W Doll ◽

A Al-Ahmad ◽

A Bacher ◽

A Muslija ◽

R Thelen ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Bacterial Adhesion ◽

Reactive Ion Etching ◽

Ion Etching ◽

Nanopillar Arrays

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Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(97)00106-2 ◽

1997 ◽

Vol 48 (1-4) ◽

pp. 237-242 ◽

Cited By ~ 113

Author(s):

Y. Inomata ◽

K. Fukui ◽

K. Shirasawa

Keyword(s):

Solar Cells ◽

Reactive Ion Etching ◽

Surface Texturing ◽

Multicrystalline Silicon ◽

Silicon Solar Cells ◽

Large Area ◽

Ion Etching ◽

Etching Method

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Fabrication of nano-scale phase change materials using nanoimprint lithography and reactive ion etching process

Thin Solid Films ◽

10.1016/j.tsf.2009.10.030 ◽

2010 ◽

Vol 518 (20) ◽

pp. 5662-5665 ◽

Cited By ~ 7

Author(s):

Ki-Yeon Yang ◽

Jong-Woo Kim ◽

Sung-Hoon Hong ◽

Jae-Yeon Hwang ◽

Heon Lee

Keyword(s):

Phase Change ◽

Nanoimprint Lithography ◽

Phase Change Materials ◽

Reactive Ion Etching ◽

Etching Process ◽

Ion Etching ◽

Nano Scale

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Large-area multicrystalline silicon solar cell fabrication using reactive ion etching (RIE)

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2010.03.029 ◽

2011 ◽

Vol 95 (1) ◽

pp. 2-6 ◽

Cited By ~ 102

Author(s):

Jinsu Yoo ◽

Gwonjong Yu ◽

Junsin Yi

Keyword(s):

Solar Cell ◽

Silicon Solar Cell ◽

Reactive Ion Etching ◽

Multicrystalline Silicon ◽

Large Area ◽

Ion Etching ◽

Solar Cell Fabrication ◽

Cell Fabrication

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Fabrication of high-aspect-ratio silicon nanopillar arrays with the conventional reactive ion etching technique

Applied Physics A ◽

10.1007/s00339-006-3748-0 ◽

2006 ◽

Vol 86 (2) ◽

pp. 193-196 ◽

Cited By ~ 33

Author(s):

Y.-F. Chang ◽

Q.-R. Chou ◽

J.-Y. Lin ◽

C.-H. Lee

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Reactive Ion Etching ◽

Etching Technique ◽

Ion Etching ◽

Nanopillar Arrays

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FABRICATION AND OPTICAL PROPERTIES OF METAL-COATED NON-CLOSE-PACKED COLLOIDAL CRYSTALS

Journal of Nonlinear Optical Physics & Materials ◽

10.1142/s0218863509004877 ◽

2009 ◽

Vol 18 (04) ◽

pp. 633-640

Author(s):

ANNA MUSTONEN ◽

HARRI LIPSANEN

Keyword(s):

Optical Properties ◽

Optical Transmission ◽

Reactive Ion Etching ◽

Colloidal Crystals ◽

Nanosphere Lithography ◽

Optical Response ◽

Ion Etching ◽

Circular Holes ◽

Shell Particles

We present a study of optical transmission through metal-coated non-close-packed colloidal crystals. The arrays combine semi-shell particles and circular holes simultaneously. We show that the optical response of the structures can be tuned by altering the size of the semi-shell particles and holes. The non-close-packed colloidal crystals were fabricated using modified nanosphere lithography and reactive ion etching.

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