scholarly journals Fractional determination of metallic copper, cuprous oxide and cupric oxide in copper oxide catalyst.

1990 ◽  
Vol 39 (1) ◽  
pp. T1-T4 ◽  
Author(s):  
Yoshikazu KIKUTA ◽  
Hiromu SAKAMOTO
Keyword(s):  
Copper Oxide ◽  
Cuprous Oxide ◽  
Oxide Catalyst ◽  
Cupric Oxide ◽  
Metallic Copper

scholarly journals Stepwise determination of metallic copper, cuprous oxide and cupric oxide using redox-titrimetric methods.

1989 ◽  
Vol 38 (6) ◽  
pp. 263-266
Author(s):  
Takeshi SAKAMOTO ◽  
Hideomi HIGUCHI ◽  
Toshio KAWAGUCHI
Keyword(s):  
Cuprous Oxide ◽  
Cupric Oxide ◽  
Metallic Copper

scholarly journals The cause of the colours shown during the oxidation of metallic copper

1927 ◽  
Vol 115 (772) ◽  
pp. 570-588 ◽  
Keyword(s):  
Thin Films ◽  
Oxide Film ◽  
Copper Oxide ◽  
Cupric Oxide ◽  
Metallic Copper ◽  
Oxide Films ◽  
Copper Surface ◽  
Considerable Time ◽  
Pass Through

During the initial stages of the oxidation of a clean metallic copper surface, and before the normal black colour of cupric oxide is finally attained, bright colours appear which pass through the first and second orders of the series of colours observed and tabulated by Newton as characteristic of thin films of air of increasing thickness. These facts have been known for a considerable time, but though the interference colours of thin films of air and those of the oxide film are produced in the same order, grave doubts have existed as to whether interference was the cause of the colours shown by the copper. This problem has been approached from measurements of the intensity of the light reflected from copper oxide films of known thickness, and the results show that interference is actually the cause of the production of the colour, though the result is complicated by the opacity of the film, the dispersion of the oxide, and the scattering of the light complementary to the film colour when the metal is burnished.

Fabrication of Nanoflowers and other Exotic Patterns

2013 ◽  
Vol 201 ◽  
pp. 159-180
Author(s):  
Hardev Singh Virk
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Copper Oxide ◽  
Cupric Oxide ◽  
Metallic Copper ◽  
Crystallographic Structure ◽  
Ammonium Bromide ◽  
Sem Images ◽  
Electro Deposition ◽  
Scanning Electron

A wide variety of metallic and metal oxide nanoflowers and other exotic patterns have been fabricated using different techniques. We have created copper and cupric oxide nanoflowers using two different techniques: electro-deposition of copper in polymer and anodic alumina templates, and cytyltrimethal ammonium bromide (CTAB)-assisted hydrothermal method, respectively. Zinc oxide and manganese oxide nanoflowers have been synthesized by thermal treatment. Characterization of nanoflowers is done in the same way as for nanowires using XRD, SEM, TEM and FESEM. Scanning Electron Microscope (SEM) images record some interesting morphologies of metallic copper nanoflowers. Field Emission Scanning Electron Microscope (FESEM) has been used to determine morphology and composition of copper oxide nanoflowers. X-ray diffraction (XRD) pattern reveals the monoclinic phase of CuO in the crystallographic structure of copper oxide nanoflowers. Nanoflowers find interesting applications in industry. There is an element of random artistic design of nature, rather than science, in exotic patterns of nanoflowers fabricated in our laboratory.

scholarly journals Cu 4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

2021 ◽  
Vol 67 (3 May-Jun) ◽  
pp. 495
Author(s):  
M. A. Cruz Almazán ◽  
E. Vigueras Santiago ◽  
R. López ◽  
S. Hernández López ◽  
V. Hugo Castrejón Sánchez ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Copper Oxide ◽  
Cuprous Oxide ◽  
Cupric Oxide ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
X Ray ◽  
Reactive Rf Magnetron Sputtering

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000 °C for 24 h in airatmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed by a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However,Raman measurements indicated that the Cu4O3 thin films are also composed by amorphous CuO and Cu2O.

scholarly journals I. Note on the development of voltaic electricity by atmospheric oxidation

1887 ◽  
Vol 42 (251-257) ◽  
pp. 212-216
Keyword(s):  
Aqueous Solution ◽  
Copper Oxide ◽  
Cupric Oxide ◽  
Metallic Copper ◽  
Atmospheric Oxidation ◽  
Atmospheric Air ◽  
Air Supply ◽  
Set Up

It is well known that when metallic copper is brought into contact simultaneously with atmospheric air and aqueous solution of ammonia, rapid oxidation is set up, the copper oxide formed dissolving in the liquid, producing a blue solution of ammoniacal cupric oxide, or cuprammonium hydroxide. Whilst investigating processes for the manufacture of this fluid (now used commercially on a considerable scale) we noticed that if the air supply be greatly in deficiency relatively to the bulk of the copper, under certain conditions the solution is but little coloured, containing copper dissolved principally as cuprous, and not as cupric, oxide.

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