scholarly journals The cause of the colours shown during the oxidation of metallic copper

1927 ◽  
Vol 115 (772) ◽  
pp. 570-588 ◽  
Keyword(s):  
Thin Films ◽  
Oxide Film ◽  
Copper Oxide ◽  
Cupric Oxide ◽  
Metallic Copper ◽  
Oxide Films ◽  
Copper Surface ◽  
Considerable Time ◽  
Pass Through

During the initial stages of the oxidation of a clean metallic copper surface, and before the normal black colour of cupric oxide is finally attained, bright colours appear which pass through the first and second orders of the series of colours observed and tabulated by Newton as characteristic of thin films of air of increasing thickness. These facts have been known for a considerable time, but though the interference colours of thin films of air and those of the oxide film are produced in the same order, grave doubts have existed as to whether interference was the cause of the colours shown by the copper. This problem has been approached from measurements of the intensity of the light reflected from copper oxide films of known thickness, and the results show that interference is actually the cause of the production of the colour, though the result is complicated by the opacity of the film, the dispersion of the oxide, and the scattering of the light complementary to the film colour when the metal is burnished.

scholarly journals Temperature-dependent phase evolution of copper-oxide thin-films on Au(111)

2018 ◽  
Vol 20 (8) ◽  
pp. 5636-5643 ◽  
Author(s):  
Christoph Möller ◽  
Hanna Fedderwitz ◽  
Claudine Noguera ◽  
Jacek Goniakowski ◽  
Niklas Nilius
Keyword(s):  
Thin Films ◽  
Phase Transitions ◽  
Dft Calculations ◽  
Copper Oxide ◽  
Structural Phase ◽  
Oxide Films ◽  
Phase Evolution ◽  
Structural Phase Transitions ◽  
Oxide Thin Films ◽  
Temperature Dependent

STM and DFT calculations are employed to explore structural phase transitions in thin copper-oxide films grown on Au(111).

scholarly journals The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films

RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29394-29401
Author(s):  
Chandrasekaran Abinaya ◽  
Kevin Bethke ◽  
Virgil Andrei ◽  
Jonas Baumann ◽  
Beatrix Pollakowski-Herrmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Thermoelectric Properties ◽  
Oxide Films ◽  
Thermoelectric Performance ◽  
Annealing Atmosphere ◽  
Oxide Thin Films ◽  
Post Deposition Annealing ◽  
Annealing Conditions ◽  
Post Deposition

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.

Effect of post-annealing on the properties of copper oxide thin films obtained from the oxidation of evaporated metallic copper

2008 ◽  
Vol 254 (13) ◽  
pp. 3949-3954 ◽  
Author(s):  
V. Figueiredo ◽  
E. Elangovan ◽  
G. Gonçalves ◽  
P. Barquinha ◽  
L. Pereira ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Metallic Copper ◽  
Oxide Thin Films ◽  
Post Annealing

Atomic layer deposition of zirconium oxide on copper patterned silicon substrate

2014 ◽  
Vol 7 (1) ◽  
Author(s):  
J. Parulekar ◽  
S. Selvaraj ◽  
C.G. Takoudis
Keyword(s):  
Growth Rate ◽  
Atomic Layer Deposition ◽  
Copper Oxide ◽  
Metallic Copper ◽  
Atomic Layer ◽  
Copper Surface ◽  
Silicon Surfaces ◽  
Silicon Substrates ◽  
Copper Surfaces ◽  
Layer Deposition

Atomic layer deposition (ALD) was performed on copper patterned silicon substrates using zirconium precursor and ethanol as both an oxygen source and reducing agent. Ethanol targeted copper oxide formed on the copper surface, reverting it back to metallic copper. Selective ALD (SALD) of metal oxides on silicon surfaces over copper surfaces has been demonstrated up to 2-3 nm, though the process seems to lose its selectivity afterwards. We strive to maintain selectivity to thicker films by stepping away from conventional ALD processes utilizing oxidants. From previous studies with HfO2 and TiO2 SALD, we speculate that the oxidation of copper to copper oxide spoils selectivity. In this present study, we carried out oxidant-free ALD by using ethanol as a co-reactant solely on the silicon portion of these substrates. This process will occur in-situ every 20-30 ALD cycles for ALD of ZrO2. As expected, reduced ALD growth rate was observed with ethanol compared to that of water or ozone, with a growth rate of about 0.04 nm/cycle on the silicon portion of the substrate.

scholarly journals The application of semi-conductivity measurements in the study of catalysis on copper oxide

1949 ◽  
Vol 197 (1050) ◽  
pp. 314-320 ◽  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Copper Oxide ◽  
Cupric Oxide ◽  
Oxide System ◽  
Conductivity Measurements ◽  
Conductivity Of Thin Films

An apparatus has been constructed to measure the electrical conductivity of thin films of oxides in order to study the effects of adsorbed gases and reactions between them. This has been applied to the cuprous-cupric oxide system.

Fabrication of Nanoflowers and other Exotic Patterns

2013 ◽  
Vol 201 ◽  
pp. 159-180
Author(s):  
Hardev Singh Virk
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Copper Oxide ◽  
Cupric Oxide ◽  
Metallic Copper ◽  
Crystallographic Structure ◽  
Ammonium Bromide ◽  
Sem Images ◽  
Electro Deposition ◽  
Scanning Electron

A wide variety of metallic and metal oxide nanoflowers and other exotic patterns have been fabricated using different techniques. We have created copper and cupric oxide nanoflowers using two different techniques: electro-deposition of copper in polymer and anodic alumina templates, and cytyltrimethal ammonium bromide (CTAB)-assisted hydrothermal method, respectively. Zinc oxide and manganese oxide nanoflowers have been synthesized by thermal treatment. Characterization of nanoflowers is done in the same way as for nanowires using XRD, SEM, TEM and FESEM. Scanning Electron Microscope (SEM) images record some interesting morphologies of metallic copper nanoflowers. Field Emission Scanning Electron Microscope (FESEM) has been used to determine morphology and composition of copper oxide nanoflowers. X-ray diffraction (XRD) pattern reveals the monoclinic phase of CuO in the crystallographic structure of copper oxide nanoflowers. Nanoflowers find interesting applications in industry. There is an element of random artistic design of nature, rather than science, in exotic patterns of nanoflowers fabricated in our laboratory.

scholarly journals Effects of Copper Surface Oxidation and Reduction on Shear-Bond Strength Using Functional Monomers

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1753
Author(s):  
Haruto Hiraba ◽  
Hiroyasu Koizumi ◽  
Akihisa Kodaira ◽  
Kosuke Takehana ◽  
Takayuki Yoneyama ◽  
...  
Keyword(s):  
Bond Strength ◽  
Copper Oxide ◽  
Photoelectron Spectroscopy ◽  
Shear Bond Strength ◽  
Oxide Films ◽  
Surface Oxidation ◽  
Acrylic Resin ◽  
Copper Surface ◽  
Dihydrogen Phosphate ◽  
Functional Monomers

This study was conducted to clarify the influence of the copper surface oxidation and reduction on the shear-bond strength with functional monomers. Unheated copper specimens (UH; n = 88) were wet-ground. Three-quarters of the UH were then heated (HT). Two-thirds of the HT was then immersed in a hydrochloric acid solution (AC). Half of the AC was then reheated (RH). Each group was further divided into two groups (n = 11), which were primed by either 6-methacryloyloxyhexyl 2-thiouracil-5-carboxylate (MTU-6) or 10-methacryloyloxydecyl dihydrogen phosphate (MDP). The shear-bond strength tests were used for bonding with an acrylic resin. The surface roughness values and chemical states of the four groups were analyzed using a confocal scanning laser microscope and X-ray photoelectron spectroscopy (XPS). The shear-bond strengths of HT and RH were the lowest in the MTU-6-primed groups. The result of AC was significantly lower than others in the MDP-primed groups. The XPS results showed that the surfaces of UH and AC consisted of Cu2O and Cu. The surface changed to CuO upon heating. The presence or absence of copper-oxide films showed the opposite trends in the effectiveness of MTU-6 and MDP to improve bond strength. The results could elucidate the effects of functional monomers on copper-oxide films.

Effects of Annealing Process on the Structural, Optical and Electrical Properties of Copper Oxide Thin Films Grown by Immersion Technique

2016 ◽  
Vol 1133 ◽  
pp. 439-443
Author(s):  
Mohd Fauzee Nurfazliana ◽  
Sharul Ashikin Kamaruddin ◽  
Nayan Nafarizal ◽  
Hashim Saim ◽  
Mohd Zainizan Sahdan
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Oxide Films ◽  
Annealing Process ◽  
Oxide Thin Films ◽  
X Ray ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Large Clusters ◽  
Small Clusters

The synthesized and characterization on the growth of copper oxide thin films on fluorine-doped tin oxide (FTO) coated glass with annealing and without annealing process has been studied by immersion techniques. Furthermore, ZnO layer has been used in order to improved the absorption spectrum of CuO films. The copper oxide films were analyzed on the morphological, structural, optical and electrical by field emission scanning electron microscopy (FESEM), X-ray diffractometer (XRD), UV-Vis spectroscopy (absorbance) and I-V characteristics instruments. The atomic force microscope (AFM) was used in order to characterize the surface imaging of copper oxide films and the thicknesses were measured using a surface profiler. The AFM studies revealed that the roughness of the CuO films increased after annealing was applied this is due to the formation of large clusters of grains from the merging of small clusters grains. The CuO films thicknesses also becomes two times higher than the CuO films without annealing process.

scholarly journals Cu 4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

2021 ◽  
Vol 67 (3 May-Jun) ◽  
pp. 495
Author(s):  
M. A. Cruz Almazán ◽  
E. Vigueras Santiago ◽  
R. López ◽  
S. Hernández López ◽  
V. Hugo Castrejón Sánchez ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Copper Oxide ◽  
Cuprous Oxide ◽  
Cupric Oxide ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
X Ray ◽  
Reactive Rf Magnetron Sputtering

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000 °C for 24 h in airatmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed by a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However,Raman measurements indicated that the Cu4O3 thin films are also composed by amorphous CuO and Cu2O.

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