Microhollow Cathode Plasmas for Low Temperature, Ambient Diamond Growth

2011 ◽  
Author(s):  
Christine Cuppoletti
1995 ◽  
Vol 13 (3) ◽  
pp. 1617-1618 ◽  
Author(s):  
Zoltan Ring ◽  
Thomas D. Mantei ◽  
Spirit Tlali ◽  
Howard E. Jackson

2001 ◽  
Vol 89 (2) ◽  
pp. 1484-1492 ◽  
Author(s):  
James R. Petherbridge ◽  
Paul W. May ◽  
Sean R. J. Pearce ◽  
Keith N. Rosser ◽  
Michael N. R. Ashfold

2008 ◽  
Vol 17 (7-10) ◽  
pp. 1252-1255 ◽  
Author(s):  
A. Kromka ◽  
Š. Potocký ◽  
J. Čermák ◽  
B. Rezek ◽  
J. Potměšil ◽  
...  

2000 ◽  
Vol 9 (3-6) ◽  
pp. 246-250 ◽  
Author(s):  
Simon Proffitt ◽  
Christopher H.B. Thompson ◽  
Aurora Gutierrez-Sosa ◽  
Nathan Paris ◽  
Nagindar K. Singh ◽  
...  

1996 ◽  
Vol 5 (11) ◽  
pp. 1318-1322 ◽  
Author(s):  
I. Schmidt ◽  
F. Hentschel ◽  
C. Benndorf

Author(s):  
Tibor Izak ◽  
Oleg Babchenko ◽  
Stepan Potocky ◽  
Zdenek Remes ◽  
Halyna Kozak ◽  
...  

2001 ◽  
Vol 10 (3-7) ◽  
pp. 393-398 ◽  
Author(s):  
J. Petherbridge ◽  
P.W. May ◽  
S.R.J. Pearce ◽  
K.N. Rosser ◽  
M.N.R. Ashfold

2012 ◽  
Vol 249 (12) ◽  
pp. 2600-2603 ◽  
Author(s):  
Tibor Izak ◽  
Oleg Babchenko ◽  
Marian Varga ◽  
Stepan Potocky ◽  
Alexander Kromka

1994 ◽  
Vol 349 ◽  
Author(s):  
Evaldo. J. Corat ◽  
V. J. Trava-Airoldi ◽  
Nélia F. Leite ◽  
Angel F.V. Peña ◽  
Vítor Baranauskas

ABSTRACTIn this work we show that the addition of a small amount of CF4 to a regular CH4 -H2 gas mixture allows diamond growth at lower temperatures with reasonable growth rates. We used a hot filament assisted reactor and observed diamond growth with a substrate temperature as low as 390 ଌ. We present a comparative study for the growth dependence on substrate temperature with and without CF4 addition in the gas mixture. The growth rate is measured by post growth weighting with a micro balance. Raman spectroscopy, SEM and AFM images show the good quality of the films grown at low temperatures when CF4 is added to the feeding gas.


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