scholarly journals Multi-objective optimization of ciprofloxacin antibiotic removal from an aqueous phase with grey taguchi method

2018 ◽  
Vol 16 (4) ◽  
pp. 530-541 ◽  
Author(s):  
M. Salari ◽  
G. R. Rakhshandehroo ◽  
M. R. Nikoo

Abstract Optimization methods are used to study and survey the optimal values for input factors and effect of optimized parameters on response variables. In this study, the effect of different factors on ciprofloxacin (CIP) removal of water soluble was studied. In this regard, a multi-objective optimization was performed utilizing the Taguchi method based on a grey relational analysis. Optimum levels of factors were determined to optimize three responses simultaneously with grey Taguchi. Meanwhile, grey relational analysis was applied to model and optimize three target responses, namely, CIP removal, chemical oxygen demand (COD) removal, and sludge to iron ratio. Multi-objective optimization results obtained based on grey relational analysis showed that the optimal value of the input factors were CIP concentration of 100 mg/L, H2O2 concentration of 100 mM, Fe(II) concentration of 10 mM, pH of 3, and a reaction time of 15 min. To confirm the results, the values obtained through a confirmation test were examined. Multi-objective optimization results from process factors were determined by analysis of variance (ANOVA) analysis and grey Taguchi method. Based on ANOVA analysis for the grey relational grade, Fe(II) concentration and H2O2 concentration were found to be the most influencing factors.

2014 ◽  
Vol 15 ◽  
pp. 832-840 ◽  
Author(s):  
J.B. Saedon ◽  
Norkamal Jaafar ◽  
Mohd Azman Yahaya ◽  
NorHayati Saad ◽  
Mohd Shahir Kasim

2012 ◽  
Vol 217-219 ◽  
pp. 2183-2186
Author(s):  
Chao Wei Tang ◽  
Li Chang Chuang ◽  
Hong Tsu Young ◽  
Mike Yang ◽  
Hsueh Chuan Liao

The robust design of chemical etching parameters is dealing with the optimization of the through-silicon via (TSV) roundness error and TSV lateral etching depth in the etching of silicon for laser drilled TSVs. The considered wet chemical etching parameters comprise the HNO3 molarity, HF molarity, and etching time. Grey-Taguchi method is combining the orthogonal array design of experiments with Grey relational analysis (GRA), which enables the determination of the optimal combination of wet chemical etching parameters for multiple process responses. The concept of Grey relational analysis is to find a Grey relational grade, which can be used for the optimization conversion from a multiple objective case to a single objective case. Also, GRG is used to investigate the parameter effects to the overall quality targets.


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