Growth of GaN layers on Si(111) substrates by plasma-assisted molecular beam epitaxy
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AbstractThe studies of the growth kinetics of GaN layers grown on nitridated Si(111) substrates by plasmaassisted molecular beam epitaxy are presented. The nucleation and overgrowth of the separate GaN/Si(111) nanocolumns during single growth run is demonstrated. The technique of the in situ control of the GaN/Si(111) nanocolumns lateral size is proposed.
2020 ◽
Vol 32
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pp. 475002
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2010 ◽
Vol 312
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pp. 209-212
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1999 ◽
Vol 201-202
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pp. 461-464
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2005 ◽
Vol 357
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2011 ◽
Vol 323
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pp. 68-71
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