Формирование текстуры (100) в тонких пленках Ti под действием низкоэнергетической ионной бомбардировки
2021 ◽
Vol 47
(23)
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pp. 35
10-40 nm Ti films with mixed crystalline texture (100)+(001) are exposed to ion bombardment in inductively coupled Ar plasma by applying the bias -30 V to the films. It is found that such a treatment leads to the formation of (100) texture in films. This result is explained by the generation of the compressive stress in films as a result of ion bombardment. The thinner the film the less time is required to form the (100) texture.
2004 ◽
Vol 22
(5)
◽
pp. 2101-2106
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2003 ◽
Vol 16
(5)
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pp. 378-384
2020 ◽
Vol 109
◽
pp. 104929
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2004 ◽
Vol 33
(4)
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pp. 358-363
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