scholarly journals Effect of Electrodes Separation in DC Plasma Sputtering on Morphology of Silver Coated Samples

2016 ◽  
Vol 19 (4) ◽  
pp. 78-85
Author(s):  
Khalid A. Yahya ◽  
◽  
Ban F. Rasheed ◽  
Keyword(s):  
Dc Plasma ◽  
Plasma Sputtering

Pulsed DC-plasma sputtering induced synthesis of hydrogenated carbon thin films for L-929 cell cultivation

2016 ◽  
Vol 307 ◽  
pp. 1119-1123 ◽  
Author(s):  
Jin Xiang Piao ◽  
Manish Kumar ◽  
Amjed Javid ◽  
Seokyoung Yoon ◽  
Jung Heon Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Cell Cultivation ◽  
Dc Plasma ◽  
Plasma Sputtering ◽  
Pulsed Dc ◽  
Carbon Thin Films

The synthesis and characteristics of polymer nanoballs by plasma polymerization cooperating with DC plasma sputtering technique

2010 ◽  
Vol 518 (22) ◽  
pp. 6609-6613 ◽  
Author(s):  
Zhongqing Jiang ◽  
Xinyao Yu ◽  
Yicai Shi ◽  
Yuedong Meng
Keyword(s):  
Plasma Polymerization ◽  
Dc Plasma ◽  
Plasma Sputtering

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

Influence of Si Surface Roughness on Electrical Characteristics of MOSFET with HfON Gate Insulator Formed by ECR Plasma Sputtering

2014 ◽  
Vol E97.C (5) ◽  
pp. 413-418 ◽  
Author(s):  
Dae-Hee HAN ◽  
Shun-ichiro OHMI ◽  
Tomoyuki SUWA ◽  
Philippe GAUBERT ◽  
Tadahiro OHMI
Keyword(s):  
Surface Roughness ◽  
Gate Insulator ◽  
Electrical Characteristics ◽  
Ecr Plasma ◽  
Plasma Sputtering

In situ deposition of magnetic nanoparticles on glass mat using plasma sputtering method

2021 ◽  
pp. 1-11
Author(s):  
Sheila Shahidi ◽  
Sanaz Dalalsharifi ◽  
Mahmood Ghoranneviss ◽  
Rattanaphol Mongkholrattanasit
Keyword(s):  
Magnetic Nanoparticles ◽  
Plasma Sputtering ◽  
In Situ Deposition ◽  
Glass Mat
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