scholarly journals Role of Forensic Chemist in crime investigation

2016 ◽  
Vol 4 (1) ◽  
Author(s):  
Devendra Kumar

Edmund Locard is the father of Forensic Chemistry. Forensic means scientific test or techniques used in connection with detection of crime. A Forensic Physician analyzes a variety of suspected substances, most often for law enforcement purposes. A Forensic Chemist can assist in the identification of unknown material found at a crime scene. Forensic Chemist uses G.C.-M.S.(Gas Chromatography- Mass Spectroscopy) analysis, A.A.S.(Atomic Absorption Spectroscopy), F.T.I.R.S.(Fourier Transform Infrared Spectroscopy), T.L.C.(Thin Layer Chromatography). A.A.S. is destructive and F.T.I.R.S is a non-destructive process to identify a substance.

Author(s):  
Muthanna Saadi Farhan ◽  
Amjed Haseeb Khamees ◽  
Omar Hussein Ahmed ◽  
Amani AmerTawfeeq ◽  
Yahya Saad Yaseen

Chenopodium murale L. it is an essential annual herbaceous weed belongs to the genus Chenopodium and family Chenopodiaceae. Chenopodium murale L. commonly called as nettle leaf goosefoot. Aim of this study is the gas chromatography-mass spectroscopy analysis of chemical constituents of Chenopodium murale leaves in two different extracts; n-hexane and chloroform. These extracts contain 37 chemical components which are Monoterpenes, steroids precursor and fatty acids. Furthermore the n- hexane extract revealed about 35.22% of cyclic and acyclic monoterpenoids, fatty acid about 2.07%, also 2.31% of nitrogenous compounds and sterol precursor about 0.41%. However the chloroform extract revealed the presence of linolenic acid representing 13.54% and neo menthol representing 18.87%, also the other minor components are carvone oxide (0.27%), alpha- pinene epoxide (1.71%), Trans- Squalene (0.77%) and other minor bioactive components.


2018 ◽  
Vol 30 (7) ◽  
pp. 1599-1602
Author(s):  
Chandan Krishnamoorthy ◽  
Soumya Krishnan Uma ◽  
Pooja Prafull Jadhav ◽  
Kashifa Ghazal ◽  
Ramalingam Chidambaram

1995 ◽  
Vol 378 ◽  
Author(s):  
R. J. Molnar ◽  
K. B. Nichols ◽  
P. Maki ◽  
E. R. Brown ◽  
I. Melngailis

AbstractGallium nitride (GaN) films grown by hydride vapor phase epitaxy on a variety of substrates have been investigated to study what role silicon and oxygen impurities play in determining the residual donor levels found in these films. Secondary ion mass spectroscopy analysis has been performed on these films and impurity levels have been normalized to ion implanted calibration standards. While oxygen appears to be a predominate impurity in all of the films, in many of them the sum of silicon and oxygen levels is insufficient to account for the donor concentration determined by Hall measurements. This suggests that either another impurity or a native defect is at least partly responsible for the autodoping of GaN. Additionally, the variation of impurity and carrier concentration with surface orientation and/or nucleation density suggests either a crystallographic or defect-related incorporation mechanism.


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