Depth Profile Analysis of Structures in ArF Resists by 172nm VUV Curing and Dry Etching Process Using .MU.-FTIR with Gradient Shaving Preparation
2004 ◽
Vol 17
(4)
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pp. 535-540
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Keyword(s):
1990 ◽
Vol 15
(8)
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pp. 463-465
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2014 ◽
Vol 29
(11)
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pp. 2072-2077
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1990 ◽
Vol 52
(1)
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pp. 79-82
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2000 ◽
Vol 157
(3)
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pp. 191-198
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Keyword(s):
1993 ◽
Vol 346
(1-3)
◽
pp. 92-95
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1978 ◽
Vol 149
(1-3)
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pp. 497-506
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