The Modification of Optical Properties of the Surfaces by the Glancing Angle Deposition Technique

The paper considers the optical properties and structure of thin films of titanium dioxide formed by the glancing angle deposition method. It was show that this method allows the formation of coatings having a significantly lower refractive index than that of the initial material. Thus, the experimentally obtained value of the refractive index of thin films of titanium dioxide was ~1.2, which is almost two times less than that of a polycrystalline material. This allows you to use this method to produce the coatings with a variable refractive index using only one material, changing the geometry of the deposition process only.

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Microstructure-Induced Anisotropic Optical Properties of YF3 Columnar Thin Films Prepared by Glancing Angle Deposition

Nanomaterials ◽

10.3390/nano10122413 ◽

2020 ◽

Vol 10 (12) ◽

pp. 2413

Author(s):

Yao Shan ◽

Pian Liu ◽

Yao Chen ◽

Haotian Zhang ◽

Huatian Tu ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Volume Fraction ◽

Electron Beam Evaporation ◽

Glancing Angle Deposition ◽

Refractive Indices ◽

Glancing Angle ◽

Axis Parallel ◽

Angle Deposition ◽

Deposition Angle

Yttrium fluoride (YF3) columnar thin films (CTFs) were fabricated by electron beam evaporation with the glancing angle deposition method. The microstructures and optical properties of YF3 CTFs were studied systematically. The YF3 films grown at different deposition angles are all amorphous. As the deposition angle increases, the columns in YF3 CTFs become increasingly separated and inclined, and the volume fraction of YF3 decreases, resulting in lower refractive indices. This phenomenon is attributed to the self-shadowing effect and limited adatom diffusion. The YF3 CTFs are optically biaxial anisotropic with the long axis (c-axis) parallel to the columns, the short axis (b-axis) perpendicular to the columns, and the other axis (a-axis) parallel to the film interface. The principal refractive index along the b-axis for the 82°-deposited sample is approximately 1.233 at 550 nm. For the 78°-deposited sample, the differences of principal refractive indices between the c-axis and the b-axis and between the a-axis and the b-axis reach the maximum 0.056 and 0.029, respectively. The differences of principal refractive indices were affected by both the deposition angle and the volume fraction of YF3.

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Optical Properties of WO3 Thin Films Modeled by Finite-Difference Time-Domain and Fabricated by Glancing Angle Deposition

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2012.6761 ◽

2012 ◽

Vol 12 (12) ◽

pp. 9125-9130 ◽

Cited By ~ 3

Author(s):

Cédric Charles ◽

Nicolas Martin ◽

Michel Devel

Keyword(s):

Thin Films ◽

Optical Properties ◽

Finite Difference ◽

Time Domain ◽

Finite Difference Time Domain ◽

Glancing Angle Deposition ◽

Glancing Angle ◽

Difference Time ◽

Wo3 Thin Films ◽

Angle Deposition

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Structural and optical properties of nanostructured TiO2 thin films fabricated by glancing angle deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2006.05.091 ◽

2007 ◽

Vol 431 (1-2) ◽

pp. 287-291 ◽

Cited By ~ 54

Author(s):

Sumei Wang ◽

Guodong Xia ◽

Hongbo He ◽

Kui Yi ◽

Jianda Shao ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Glancing Angle Deposition ◽

Structural And Optical Properties ◽

Tio2 Thin Films ◽

Nanostructured Tio2 ◽

Glancing Angle ◽

Angle Deposition

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Optical properties of chiral thin films fabricated by glancing angle deposition

10.1117/12.351250 ◽

1999 ◽

Author(s):

Jeremy C. Sit ◽

Scott R. Kennedy ◽

Dick J. Broer ◽

Michael J. Brett

Keyword(s):

Thin Films ◽

Optical Properties ◽

Glancing Angle Deposition ◽

Glancing Angle ◽

Angle Deposition

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Various methods used to etch titanium dioxide columnar thin films

MRS Proceedings ◽

10.1557/proc-1174-v10-04 ◽

2009 ◽

Vol 1174 ◽

Author(s):

Martin Roman Kupsta ◽

Mike Taschuk ◽

Michael J. Brett ◽

Jeremy C. Sit

Keyword(s):

Thin Films ◽

Titanium Dioxide ◽

Glancing Angle Deposition ◽

Ion Etching ◽

Sensing Applications ◽

Glancing Angle ◽

Wet Chemical ◽

Dry Etch ◽

Anisotropic Etch ◽

Angle Deposition

AbstractA dry etch recipe was developed for porous nanostructured TiO2 thin films fabricated using glancing angle deposition (GLAD). Unlike wet chemical etches, the technique reported here preserves the vertical post nanostructure, eliminating clumping. A highly controllable and easily tailored reactive ion etching process with CF4 alone, or combined with O2, was investigated. The anisotropic etch modifies the morphology and density of standard GLAD films, which is of interest for sensing applications.

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