OPTIMALISASI KEKUATAN BENDING HASIL 3D PRINTING MENGGUNAKAN METODE RESPONSE SURFACE PADA FILAMEN PLA (POLY LACTIC ACID)

Akhir-akhir ini teknologi baru sudah mengembangkan produksi banyak meragup keuntungan untuk yang membutuhkan teknologi past prototype. Printer 3D merupakan teknologi past prototyping yang salah satu jenisnya ialah FDM (Fused Deposition Modelling) yang terkenal dan terjangkau. PLA memiliki karakteristik transparan, bersifat kaku, berbentuk butiran, memiliki ketahanan terhadap kelembapan serta polimer yang elastis. Pada PLA nozzle temperature dan layer thickness berpengaruh terhadap keelastisitas produk. pengaruh ketebalan lapisan cetak, shell thickness mendapatkan parameter paling mendominasi pada respon tensile strength. Akan tetapi dalam hal flexural strength dari bahan PLA, parameter ketebalan lapis, deposition angle, dan pola infil, dikonfimasi ketebalan lapis yang sangat memberikan pengaruh pada bending strength bahan. Metode permukaan respon merupakan sekumpulan statistika serta kalkulasi teknik dimana berfungsi meningkatkan serta memaksimalkan proses, yang mana banyak parameter bebas mempengaruhi variabel respon. Kekuatan bending tertinggi berada pada parameter layer thickness 0.3 mm, nozzle temperature 205oC, dan infill percentage 30% dengan 71.605 MPa. Pada penelitian ini variabel layer thickness sangat berpengaruh terhadap kekuatan bending, nozzle temperature dan infill percentage tidak terlalu berpengaruh terhadap kekuatan bending. Dalam penentuan nilai optimum berdasarkan hasil analisis varian model orde 2 dengan redidual identik menyebar secara acak dan titik residual mendekati garis diagonal untuk uji kenormalan yang berarti memiliki kontribusi terhadap model. Nilai optimum dari variabel bebas menghasilkan nilai bending strength optimal yaitu 0.3 mm untuk layer thickness, 208,18oC untuk nozzle temperature dan 30% untuk infill percentage dengan bending strength yang paling optimal adalah 72,0443 MPa.

Influence of Thickness and Deposition angle on Structural and Optical Properties of Manganese Oxide Thin Films

Manganese oxide thin films were produced on glass substrates by resistive evaporation at room temperature. The layers with different thickness (30 and 90 nm) at different deposition angle (0 and 40°) were prepared by electron gun evaporation method under ultra-high vacuum condition. After deposition pure manganese oxide thin films a post-annealing proses was used in a uniform oxygen flow of 300 (sccm) and at 500o kelvin annealing temperature. Optical transmittance and reflectance of the layers were measured in the wavelength of 350–850 nm by a spectrophotometer. Kramers–Kronig relations were used to calculate the optical constant. The influence of oxygen flow and annealing temperature on optical properties is investigated. It was found that film thickness and deposition angle plays a significant role on the nanostructures as well as optical properties of layers and cause major variations in behavior of thin titanium oxide films. The physical properties of materials were characterized by X-ray diffraction (XRD), FE-SEM, AFM, EDAX, and UV-Vis techniques.

The Effect of Deposition Angle and Thickness on Structural and Optical Properties of Manganese Oxide Thin Films

Manganese oxide thin films were deposited on glass substrates by resistive evaporation at room temperature. The layers were produced with electron gun evaporation method under ultra-high vacuum condition. Thickness of the layers was measured 60 and 120 nm, by a quartz crystal method. Deposition conditions such as deposition rate, vacuum pressure, incidence of angle and substrate temperature were the same for all layers. After producing pure manganese oxide layers a post-annealing method was used in the presence of a uniform oxygen flow of 300 (sccm) and at 320 oC annealing temperature. Optical reflectance and transmittance of the layers were measured in the wavelength of 350–850 nm by a spectrophotometer. Kramers–Kronig relations were used to calculate the optical constant. The influence of annealing temperature and oxygen flow on optical properties is investigated. It was found that film thickness and deposition angle plays an important role on the nanostructures as well as optical properties of layers and cause significant variations in behavior of thin titanium oxide films. The physical properties of materials were characterized by X-ray diffraction (XRD), FE-SEM, AFM, EDX, and UV-Vis techniques.

Modeling and Experimental Investigations of Nanostructured Ag Thin Films Produced by Oblique-Angle Deposition and Its SERS Performance

The growth mechanism of nanocolumnar silver thin film deposited on a smooth silicon substrate using electron beam evaporation process at an oblique angle was simulated with the Kinetic Monte Carlo method. Following the simulated silver nanostructured thin film, a further computational simulation was done using COMSOL for surface-enhanced Raman scattering effects. The simulation results were compared against corresponding experimental results, which demonstrated high agreement between simulation results and experimental data. It was found that as the incident deposition angle increased, the density of the Ag thin film significantly decreased and the surface roughness increased. When the incident deposition angle was at 75° and 85°, the resulting nanocolumnar structure was significantly tilted. For Ag thin films deposited at all investigated angles, surface-enhanced Raman scattering effects were observed. Particularly, the Ag nanocolumns deposited at 85° showed remarkable Surface-enhanced Raman Scattering effects. This was seen in both COMSOL simulations and experimental results: Enhancement factors were 2 × 107 in COMSOL simulation and 3.3 × 105 in the experiment.

Phase Transition Induced Photocathodic p-CuFeO2 Nanocolumnar Film by Reactive Ballistic Deposition

In the present study, CuFeO vertical nanocolumnar structured arrays are deposited on fluorine-doped tin oxide substrates by reactive ballistic deposition technique in an oxygen atmosphere by fixing the deposition angle...

Microstructure-Induced Anisotropic Optical Properties of YF3 Columnar Thin Films Prepared by Glancing Angle Deposition

Yttrium fluoride (YF3) columnar thin films (CTFs) were fabricated by electron beam evaporation with the glancing angle deposition method. The microstructures and optical properties of YF3 CTFs were studied systematically. The YF3 films grown at different deposition angles are all amorphous. As the deposition angle increases, the columns in YF3 CTFs become increasingly separated and inclined, and the volume fraction of YF3 decreases, resulting in lower refractive indices. This phenomenon is attributed to the self-shadowing effect and limited adatom diffusion. The YF3 CTFs are optically biaxial anisotropic with the long axis (c-axis) parallel to the columns, the short axis (b-axis) perpendicular to the columns, and the other axis (a-axis) parallel to the film interface. The principal refractive index along the b-axis for the 82°-deposited sample is approximately 1.233 at 550 nm. For the 78°-deposited sample, the differences of principal refractive indices between the c-axis and the b-axis and between the a-axis and the b-axis reach the maximum 0.056 and 0.029, respectively. The differences of principal refractive indices were affected by both the deposition angle and the volume fraction of YF3.