Various methods used to etch titanium dioxide columnar thin films
Keyword(s):
Dry Etch
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AbstractA dry etch recipe was developed for porous nanostructured TiO2 thin films fabricated using glancing angle deposition (GLAD). Unlike wet chemical etches, the technique reported here preserves the vertical post nanostructure, eliminating clumping. A highly controllable and easily tailored reactive ion etching process with CF4 alone, or combined with O2, was investigated. The anisotropic etch modifies the morphology and density of standard GLAD films, which is of interest for sensing applications.
2016 ◽
Vol 41
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pp. 450-456
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Keyword(s):
Keyword(s):
2008 ◽
Vol 26
(4)
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pp. 881-886
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Keyword(s):
2008 ◽
Vol 28
(5-6)
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pp. 692-696
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Keyword(s):
2012 ◽
Vol 12
(12)
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pp. 9125-9130
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