scholarly journals Microwave ion source for thin oxide film formation.

Shinku ◽  
1991 ◽  
Vol 34 (3) ◽  
pp. 384-386
Author(s):  
Hiroshi MURAKAMI ◽  
Kazumi WATAHIKI ◽  
Akira IWASAKI ◽  
Isao KUDO
Keyword(s):  
Oxide Film ◽  
Film Formation ◽  
Ion Source ◽  
Thin Oxide Film ◽  
Microwave Ion Source ◽  
Thin Oxide

scholarly journals Microwave Ion Source for Thin Oxide Film Formation.

Shinku ◽  
1993 ◽  
Vol 36 (3) ◽  
pp. 271-274
Author(s):  
Hiroshi MURAKAMI ◽  
Kazumi WATAHIKI ◽  
Akira IWASAKI ◽  
Isao KUDO
Keyword(s):  
Oxide Film ◽  
Film Formation ◽  
Ion Source ◽  
Thin Oxide Film ◽  
Microwave Ion Source ◽  
Thin Oxide

Silicon Oxide Film Formation by the Simultaneous use of a Microwave Ion Source and an Icb System

1989 ◽  
Vol 157 ◽  
Author(s):  
Gikan H. Takaoka ◽  
Hiroshi Tsuji ◽  
Junzo Ishikawa
Keyword(s):  
Oxide Film ◽  
Substrate Temperature ◽  
Ionization Energy ◽  
Incident Energy ◽  
Silicon Oxide ◽  
Film Formation ◽  
Ion Source ◽  
Silicon Oxide Film ◽  
Microwave Ion Source ◽  
Simultaneous Use

ABSTRACTSiO2 films were prepared at a substrate temperature of 100°C by the simultaneous use of a microwave ion source and an ICB system. Transparent and good insulating SiO2 films could be obtained by using 02 gas ions, and they were thermally and chemically stable. Furthermore, both the ionization energy and the incident energy of the 02 gas ions were found to enhance the chemical reaction between SiO and 02 molecules, resulting in the Si02 film formation at a low substrate temperature.

ChemInform Abstract: THE KINETICS OF THIN OXIDE FILM FORMATION ON IRON USING PROTON-IMPACT-EXCITED X-RAY ANALYSIS

1973 ◽  
Vol 4 (34) ◽  
pp. no-no
Author(s):  
P. B. JUN. NEEDHAM ◽  
H. W. JUN. LEAVENWORTH ◽  
T. J. DRISCOLL
Keyword(s):  
Oxide Film ◽  
Film Formation ◽  
X Ray ◽  
Proton Impact ◽  
Thin Oxide Film ◽  
Thin Oxide ◽  
Kinetics Of

Development of an Atomic Oxygen Source for Thin Oxide Film Formation

1993 ◽  
Vol 316 ◽  
Author(s):  
S. Inoue ◽  
Y Kawagoe ◽  
K. Yamanishi ◽  
M. Tanaka
Keyword(s):  
Thin Films ◽  
Oxide Film ◽  
Substrate Temperature ◽  
Atomic Oxygen ◽  
Film Formation ◽  
Superconducting Film ◽  
Silent Discharge ◽  
Film Showing ◽  
Thin Oxide Film ◽  
Thin Oxide

ABSTRACTAtomic oxygen promotes the oxidation of thin films. The authors developed a silent discharge type atomic oxygen source for thin oxide film formation. The atomic oxygen source consists of a quartz discharge tube and two cylindrical electrodes that are attached to the outside wall of the tube. The atomic oxygen concentration is estimated to be 3%.The atomic oxygen source was installed in an ICB (Ionized Cluster Beam) apparatus and applied to the formation of Er-Ba-Cu-0 thin films. By introducing the atomic oxygen during deposition, a film showing superconductivity at 81K was obtained when the substrate temperature was 570ºC. Also the substrate temperature to obtain a film showing superconductivity at 77K was estimated to be 50 °C lower than that for obtaining superconducting film formation in an atmosphere of 6% ozone. The atomic oxygen source was also applied to SrTiO3 thin film formation. Electrical properties of this film were examined and compared with those of films prepared in an atmosphere of 6% ozone. The dielectric constant of SrTiO3 film was improved from 60 to 180 by introducing atomic oxygen instead of 6% ozone. Therefore the atomic oxygen source was proven to be advantageous for thin oxide film formation.

Generation of O2 and metalorganic cluster ion beams and its application to low-temperature thin oxide film formation

1996 ◽  
Vol 217-218 ◽  
pp. 78-81 ◽  
Author(s):  
M. Akizuki ◽  
J. Matsuo ◽  
M. Harada ◽  
S. Ogasawara ◽  
A. Doi ◽  
...  
Keyword(s):  
Low Temperature ◽  
Oxide Film ◽  
Film Formation ◽  
Ion Beams ◽  
Thin Oxide Film ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Thin Oxide

Imaging of a Thin Oxide Film Formation from the Combination of Surface Reflectivity and Electrochemical Methods

2017 ◽  
Vol 89 (10) ◽  
pp. 5303-5310 ◽  
Author(s):  
Sara Chakri ◽  
Anisha N. Patel ◽  
Isabelle Frateur ◽  
Frédéric Kanoufi ◽  
Eliane M. M. Sutter ◽  
...  
Keyword(s):  
Oxide Film ◽  
Film Formation ◽  
Electrochemical Methods ◽  
Thin Oxide Film ◽  
Surface Reflectivity ◽  
Thin Oxide
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