scholarly journals The Influence of He Discharge Gas on the Magnetic Properties of TiN-coated Grain Oriented Silicon Steel Sheets by Ion Plating Using the Hollow Cathode Discharge Method.

Shinku ◽  
1997 ◽  
Vol 40 (9) ◽  
pp. 723-727
Author(s):  
Yukio INOKUTI
1995 ◽  
Vol 49 (7) ◽  
pp. 890-899 ◽  
Author(s):  
Xiangjun Cai ◽  
J. C. Williams

Proper conditioning of the hollow cathode by sputtering is critical to the analytical performance of the hollow cathode. A pulsed discharge procedure was developed to condition the 1.5- × 5-mm stainless steel cathode. A scanning electron microscope was used to study the surface structure resulting from the conditioning. The resulting hollow bottom was bulb-shaped and the surface was mirror-like, very smooth, and shiny. The emission intensities from smooth cathodes were greater that those from the rough ones. The precision obtained here was 3–5% for Na, 5–8% for Li, and 4–10% for K. Three working curves for each element were made on different days with different cathodes that had been conditioned in the same manner for 4 h by sputtering. The three working curves virtually coincided when plotted in the same figure, demonstrating the precision and reproducibility from day to day of the hollow cathode discharge method as developed in this laboratory. The 3-σ detection limits calculated from slopes of working curves are 0.32 pg, 0.35 pg, and 3.2 pg for Na, Li, and K, respectively.


Shinku ◽  
2000 ◽  
Vol 43 (4) ◽  
pp. 524-534 ◽  
Author(s):  
Itsuo ISHIGAMI ◽  
Ken'ichi MIURA ◽  
Hideaki HOSHINO ◽  
Tomoyuki MIZUKOSHI ◽  
Fumihiro URATANI ◽  
...  

2012 ◽  
Vol 531-532 ◽  
pp. 342-345 ◽  
Author(s):  
Zhi Ming Yu ◽  
Jia Xiu Hu ◽  
Yun Song Niu ◽  
Jie Wei ◽  
Ying Yang

Multilayered TiN coating was successfully prepared by hollow cathode discharge method. By introduction of the multilayered microstructure, the columnar epitaxial growth of TiN grains was obviously suppressed. The hardness, adhesion performance and wear resistance of the multilayered TiN coating were compared with those of the ordinary TiN coating. The wear resistance of the multilayered TiN coating is much better than that of the ordinary TiN coating. It is due to the multilayered microstructure of the coating that pileups the dislocations and also inhibits the bulk-flaking behavior for the multilayered TiN coating. The morphology analysis of cross section shows that the wear mechanism of the multilayered TiN coating is the micro-area detachment. Moreover, the adhesion of the TiN coating to the substrate is greatly enhanced by the microstructure optimization of the coating.


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