Current Image Atomic Force Microscopy (CI-AFM) Combined with Atomic Force Probing (AFP) for Location and Characterization of Advanced Technology Node
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Abstract Many of the standard techniques of Failure Analysis (FA) are breaking down or becoming less useful as feature sizes drop below 100nm. The tenth micron milestone appears to be a fundamental limitation to many common techniques. Use of Current Image-Atomic Force Microscopy (CI-AFM) combined with Atomic Force Probing (AFP) brings about a combination of technologies, which allow for extension of FA below the nano-scale.