Insertion of nanocrystalline diamond film and the addition of hydrogen gas during deposition for adhesion improvement of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Effect of deposition temperature on cubic boron nitride thin film deposited by unbalanced magnetron sputtering method with a nanocrystalline diamond buffer layer

Metals and Materials International ◽

10.1007/s12540-013-6029-4 ◽

2013 ◽

Vol 19 (6) ◽

pp. 1323-1326 ◽

Cited By ~ 2

Author(s):

Eun-Sook Lee ◽

Jong-Keuk Park ◽

Wook-Seong Lee ◽

Tae-Yeon Seong ◽

Young-Joon Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Buffer Layer ◽

Deposition Temperature ◽

Cubic Boron Nitride ◽

Nanocrystalline Diamond ◽

The parameter space of hydrogen content added to Ar–nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.02.032 ◽

2013 ◽

Vol 223 ◽

pp. 75-78 ◽

Cited By ~ 5

Author(s):

J.-S. Ko ◽

J.-K. Park ◽

W.-S. Lee ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Parameter Space ◽

Bias Voltage ◽

Cubic Boron Nitride ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Cubic boron nitride thin film deposition by unbalanced magnetron sputtering and dc pulsed substrate biasing

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581146 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1331-1335 ◽

Cited By ~ 22

Author(s):

Wilfredo Otaño-Rivera ◽

Lawrence J. Pilione ◽

Juan A. Zapien ◽

Russell Messier

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Cubic Boron Nitride ◽

Thin Film Deposition ◽

Film Deposition ◽

Variation of residual stress in cubic boron nitride film caused by hydrogen addition during unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.06.092 ◽

2011 ◽

Vol 519 (22) ◽

pp. 7871-7874 ◽

Cited By ~ 14

Author(s):

H.-S. Kim ◽

J.-K. Park ◽

W.-S. Lee ◽

Y.-J. Baik

Keyword(s):

Residual Stress ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Cubic Boron Nitride ◽

Nitride Film ◽

Hydrogen Addition ◽

Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Cited By ~ 1

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics

Deposition of YBCO thin film with buffer layer by unbalanced magnetron sputtering

10.1117/12.300667 ◽

1998 ◽

Author(s):

Chunaeni Latief ◽

M. Barmawi

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Buffer Layer ◽

Ybco Thin Film ◽

Nanoimprinting of Ti–Cu-based thin-film metallic glasses deposited by unbalanced magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.11.174 ◽

2017 ◽

Vol 707 ◽

pp. 132-136 ◽

Cited By ~ 4

Author(s):

Junpei Kobata ◽

Ken-ichi Miura ◽

Kenji Amiya ◽

Yasuyuki Fukuda ◽

Yasunori Saotome

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Metallic Glasses ◽

Characteristics of Al Doped ZnO Films Prepared on Polyethylene Terephthalate Substrate by Unbalanced Magnetron Sputtering Method for Organic Thin Film Transistors

Science of Advanced Materials ◽

10.1166/sam.2015.2095 ◽

2015 ◽

Vol 7 (1) ◽

pp. 151-156

Author(s):

Jaehyeong Lee ◽

Yong Seob Park

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Transistors ◽

Organic Thin Film Transistors ◽

Zno Films ◽

Organic Thin Film ◽

Polyethylene Terephthalate Substrate

Unbalanced Magnetron ◽

Doped Zno ◽

Effect of radio-frequency electric power applied to a boron nitride unbalanced magnetron sputter target on the deposition of cubic boron nitride thin film

Metals and Materials International ◽

10.1007/s12540-013-6028-5 ◽

2013 ◽

Vol 19 (6) ◽

pp. 1317-1321

Author(s):

Ji-Sun Ko ◽

Jong-Keuk Park ◽

Wook-Seong Lee ◽

Joo-Youl Huh ◽

Young-Joon Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Radio Frequency ◽

Electric Power ◽

Cubic Boron Nitride ◽

Unbalanced Magnetron ◽

Magnetron Sputter