scholarly journals Dependence of Crystal Structure and Magnetic Properties of Sm-Co/Cu Thin Film on Layer Thickness

2005 ◽  
Vol 29 (3) ◽  
pp. 227-230 ◽  
Author(s):  
S. Takei ◽  
T. Uemizu ◽  
X. Liu ◽  
A. Morisako ◽  
M. Matsumoto
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Magnetic Properties ◽  
Layer Thickness ◽  
Cu Thin Film

Electrical Resistivity And Crystal Structure Of Nickel-Based Multilayer Thin Films

1991 ◽  
Vol 238 ◽  
Author(s):  
M. Tan ◽  
E. Haftek ◽  
A. Waknis ◽  
J. A. Barnard
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Electrical Resistivity ◽  
Layer Thickness ◽  
Volume Fraction ◽  
Multilayer Thin Films ◽  
Multilayer Thin Film ◽  
Spacer Layer ◽  
Interfacial Material ◽  
Very High

ABSTRACTThe electrical resistivity and crystal structure of three Ni-based periodic multilayer thin film systems (Al/Ni, Ti/Ni, and Cu/Ni) have been investigated. In each series of films the Ni layer thickness was systematically varied while the thickness of the ‘spacer’ layer (Al, Ti, or Cu) was fixed. In the Al/Ni and Ti/Ni systems films with very thin Ni layers (and consequently large volume fractions of spacer and ‘interfacial’ material) yielded very high resistivities which dropped rapidly with increasing Ni thickness. By contrast, the resistivity of Cu/Ni multilayers continuously increased with Ni layer thickness due to the decline in volume fraction of high conductivity Cu. Both the Al/Ni and Ti/Ni systems exhibit Ni(111) texture in the thicker Ni layer samples. As the Ni layer thickness decreases the Ni(111) peak loses intensity and broadens due to finer grain size and increasing disorder. Al-Ni and Ti-Ni compounds are also noted. In the Cu/Ni system, however, the sharpness of the Ni(111) peak passes through a minimum as the Ni layer thickness decreases but then increases for the thinnest Ni layer samples.

Crystal Structure and Magnetic Properties of Uranium Hydride UH2 Stabilized as a Thin Film

2018 ◽  
Vol 57 (23) ◽  
pp. 14727-14732 ◽  
Author(s):  
Ladislav Havela ◽  
Mykhaylo Paukov ◽  
Milan Dopita ◽  
Lukáš Horák ◽  
Daria Drozdenko ◽  
...  
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Magnetic Properties

Structure and Magnetic Properties of Fe/Cu Multilayered Thin Film

1986 ◽  
Vol 77 ◽  
Author(s):  
A. Fukizawa ◽  
M. Naoe
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Saturation Magnetization ◽  
Layer Thickness ◽  
Multilayered Structure ◽  
Total Thickness ◽  
Multilayered Film ◽  
Multilayered Films ◽  
Multilayered Thin Film

ABSTRACTFe/Cu multilayered films prepared by means of Facing Targets Sputtering have distinct multilayered structure at layer thicknesses above 7Å. The saturation magnetization of Fe in the multilayered film takes almost the bulk thicknesses Fe value above this thickness. However, multilayerd structures did not clearly form at layer thicknesses below 7Å and the saturation magnetization decreased to about half of the bulk value. Considerable variation of confirmed layer thickness, saturation magnetization and coercivity in the multilayerd films were obtained when the total thickness was below 1000Å.

The Influence of Quantum Size Effects on Magnetic Properties of Thin-Film Systems

2012 ◽  
Vol 190 ◽  
pp. 514-517 ◽  
Author(s):  
Elena E. Shalygina ◽  
Alisa Rozhnovskaya ◽  
Alexander Shalygin
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Layer Thickness ◽  
Size Effects ◽  
Kerr Effect ◽  
Hysteresis Loops ◽  
Quantum Size Effects ◽  
Dc Magnetron Sputtering ◽  
Saturation Field ◽  
Quantum Size

Results on the investigation of magnetic and magneto-optical properties of Fe/NML/Fe (NML: Mo, Ta) thin-film systems are presented. The examined samples were prepared by DC magnetron sputtering technique. The hysteresis loops and spectral dependencies of the transverse Kerr effect (TKE) were measured employing the magneto-optical magnetometer and the magneto-optical spectrometer, respectively. The saturation field of the examined trilayers was revealed to oscillate as a function of the NML layer thickness, and the period of these oscillations to depend on the Fe layer thickness. The TKE spectra of the studied systems were found to be identical but the TKE values depend on the thickness of both Fe and Mo, Ta layers.

Pengaruh Pendopingan Karbon Terhadap Struktur Kristal dan Morfologi TIO2

2019 ◽  
Vol 2 (2) ◽  
Author(s):  
Frastica Deswardani ◽  
Helga Dwi Fahyuan ◽  
Rimawanto Gultom ◽  
Eif Sparzinanda
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Grain Size ◽  
Tio2 Thin Film ◽  
Crystal Size ◽  
Diffraction Peak ◽  
Carbon Doping ◽  
Tio2 Anatase ◽  
Spray Method ◽  
Carbon Analysis

Telah dilakukan penelitian mengenai pengaruh konsentrasi doping karbon pada lapisan tipis TiO2 yang ditumbuhkan dengan metode spray terhadap struktur kristal dan morfologi TiO2. Hasil karakterisasi SEM menunjukkan bahwa penambahan doping karbon dapat meningkatkan ukuran butir. Lapisan TiO2 doping karbon 8% diperoleh ukuran butir terbesar adalah 1.35 μm, sedangkan ukuran tekecilnya adalah 0.45 μm. Sementara itu, untuk lapisan tipis TiO2 didoping karbon 15% memiliki ukuran butir terbesar yaitu 1.76 μm dan terkecil 0.9 μm. Hasil XRD menunjukkan seluruh puncak difraksi lapisan tipis TiO2 dengan doping karbon 8% dan 15% merupakan TiO2 anatase. Ukuran kristal lapisan TiO2 didoping karbon 8% diperoleh sebesar 638,08 Å dan untuk pendopingan 15% karbon ukuran kristal lapisan tipis TiO2 adalah 638,09 Å, hal ini menunjukkan ukuran kristal kedua sampel tidak mengalami perubahan yang signifikan.   TiO2 thin film with carbon doping has been successfully grown by spray method. The research on the effect of carbon doping on crystal structure and morfology of TiO2 has been prepared by varying carbon concentration (8% and 15% carbon). Analysis of SEM showed that the addition of carbon may increase the grain size. Thin film of TiO2 doped carbon 8% has the largest grain size 1.35 μm, while the smallest grain size is 0.45 μm. Meanwhile, for thin film TiO2 doped carbon 15% has the largest grain size 1.76 μm and smallest 0.9 μm. The XRD results showed the entire diffraction peak of thin film TiO2 doped carbon 8% and 15% were TiO2 anatase. The crystal size of thin film TiO2 doped carbon 8% was obtained at 638.08 Å and for thin film TiO2 doped carbon 15% the crystalline size of TiO2 thin film was 638.09 Å, this shows that the crystal size of both samples did not change significantly.    

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